Production method of television line diagram for testing photoelectronic imaging system resolution power
A photoelectric imaging and production method technology, which is applied in the direction of testing optical performance, optical instrument testing, machine/structural component testing, etc., and can solve the problems of high cost, unsatisfactory, and inability to meet the needs of higher and higher pixels for special charts, etc. , to achieve the effect of good versatility, avoiding Chart usage and distribution errors, and low cost
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[0056] Parameters related to chart design:
[0057] CMOS Sensor parameters: pixel array: 640 x 480; pixel size: 3.0um
[0058] Lens parameters: F / No.=2.8; EFL=1.96mm
[0059] For the optimal imaging distance and line width of all levels of this photoelectric imaging system:
[0060] Best focusing distance: 30cm;
[0061] Line width:
[0062] 400TVL: 0.5474mm
[0063] 350TVL: 0.6256mm
[0064] 300TVL: 0.7299mm
[0065] 250TVL: 0.8759mm
[0066] 200TVL: 1.095mm
[0067] Take pictures of the pair clusters to determine if the pairs and the pair clusters are arranged properly:
[0068] Photographs taken of line-pair clusters in the central area:
[0069] The central 400TVL line pair cannot be clearly distinguished, the 350TVL line pair can be distinguished, and the 300TVL line pair can be clearly distinguished. It shows that the line pair selection is reasonable and the line pair cluster arrangement is correct;
[0070] 0.7 field of view area line-to-cluster shooting pho...
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