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Sub-wavelength fused silica transmission polarization light-splitting grating at 1064 nano wave band

A technology of fused silica and polarization beam splitting, applied in the direction of diffraction grating, optics, optical elements, etc.

Inactive Publication Date: 2009-09-30
CHONGQING UNIV OF ARTS & SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

To the best of our knowledge, no subwavelength fused silica transmission polarization beamsplitting grating has been proposed for the 1064 nm band

Method used

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  • Sub-wavelength fused silica transmission polarization light-splitting grating at 1064 nano wave band
  • Sub-wavelength fused silica transmission polarization light-splitting grating at 1064 nano wave band
  • Sub-wavelength fused silica transmission polarization light-splitting grating at 1064 nano wave band

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Experimental program
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Embodiment Construction

[0019] Subwavelength fused silica transmission polarization beam-splitting gratings are fabricated by microfabrication. The production process includes: chrome-plating of quartz substrate → coating of photoresist → exposure → development → etching → removal of residual chromium film and other steps. Firstly, a layer of uniform chromium film is basically deposited on clean and dry fused silica, and a layer of positive photoresist is uniformly coated on the chromium film. The grating is then recorded using holographic exposure, as Figure 6 As shown, the He-Cd laser, with a wavelength of 441 nanometers, emits two beams of plane waves to form an interference field on the quartz substrate at an angle of 2θ, and the angle is passed by the formula θ=sin -1 [λ / (2×Λ)] is determined, where λ is the wavelength of the recording light, and Λ is the grating period to be processed. After the exposure is completed, develop, and transfer the photoresist pattern from the photoresist to the c...

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Abstract

The invention relates to a fused silica transmission polarization light-splitting grating used at 1064 nano wave band. The grating is characterized in that the cycle of the grating is 604 to 624 nanometers; the groove depth is 1.32 to 1.42 micrometres; and the dutyfactor is 0.5. The polarization light-splitting grating only has minus 1 order and 0 order diffraction, and can respectively diffract TE polarization and TM polarization incident ray to minus 1 order and 0 order transmitted light beams under the condition of autocollimation right-angle setting; and the transmission rate and diffraction rate are respectively higher than 84 percent and 96 percent, while the extinction ratio is more than 20 dB. The sub-wavelength fused silica transmission polarization light-splitting grating is made by a micro machining method, and can realize batch production at low cost; moreover, the manufactured grating has good polarization light-splitting characteristic and stable and reliable performance.

Description

technical field [0001] This patent relates to a fused silica transmission polarization beam splitting grating device, in particular a 1064 nanometer band sub-wavelength fused silica polarization beam splitting grating with self-collimation angle setting. Background technique [0002] The 1064nm band is one of the common light source wavelengths for high-intensity laser systems, and is widely used in industry, national defense and scientific research. Polarizing beam splitters are often used in laser systems. Polarizing beam splitters are required to have high extinction ratio and diffraction efficiency, wide angle adaptation range and working wavelength, stable and reliable performance, and not easy to damage. Traditional polarizing beam splitters are usually composed of dichroic materials such as birefringent crystals or multilayer dielectric films. Birefringent crystals are large in size and low in efficiency, which cannot meet the requirements of miniaturization, integrat...

Claims

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Application Information

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IPC IPC(8): G02B5/18G02B27/28
Inventor 赵华君袁代蓉
Owner CHONGQING UNIV OF ARTS & SCI