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Improved radio-frequency power supply for plasma discharge at atmospheric pressure

A technology of plasma and radio frequency power supply, which is applied in the direction of plasma, circuit, transformer, etc., to achieve the effect of simple circuit, good conduction characteristics and high power factor

Inactive Publication Date: 2009-10-28
李庆荣 +4
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For the plasma excited by continuous radio frequency, when the plasma working parameters are strictly controlled, such as gas composition, electrode structure, etc., and there are strict requirements on the working environment around the plasma, uniform discharge can also be achieved, but Plasma is easier to transform from a glow discharge state to a filament discharge state

Method used

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  • Improved radio-frequency power supply for plasma discharge at atmospheric pressure
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  • Improved radio-frequency power supply for plasma discharge at atmospheric pressure

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Embodiment Construction

[0033] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0034] figure 1 Among them, the AC input passes through the power frequency and high frequency filter 1 which is composed of a common common differential mode filter, and then is rectified to DC level by the power frequency rectification circuit 2 of the full bridge, and then connected to the self-excited high frequency inverter The power supply 3, becomes a stable DC level. After the DC level passes through the RF filter 4, it is connected to the pulse regulator 5, and after outputting a controllable pulse modulation signal, it controls the self-excited RF oscillator 6 of the next stage, and then outputs a gap-type RF wave through the RF matching device 7 and finally Connected to the plasma load. The self-excited radio frequency oscillator 6 also outputs sampling signals to the signal processor 8 , and the signal processor 8 feeds back the signals to...

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Abstract

The invention discloses an improved radio-frequency power supply for plasma discharge at atmospheric pressure, which solves the problem that the prior self-excitation type radio-frequency oscillating circuit has poor stability and low efficiency. The power supply adopts a switch regulator circuit and achieves the modulating action of a controllable pulse wave to a radio-frequency signal. When applied to the plasma discharge at the atmospheric pressure, the power supply can effectively solve the problems of filamentary discharge and electrode overheating easily generated by the radio-frequency source excitation of the atmospheric plasma which works in a continuous state. Simultaneously, an O-shaped filter (of which the radio-frequency attenuation reaches over 30 dB) consisting of an L-shaped filter and a reversed L-shaped filter is introduced in a circuit, thus a pulse modulation radio-frequency wave has good transmission characteristic. The power supply has the advantages of simple circuit, strong impact resistance, high power factor, small volume, reliable running and the like.

Description

technical field [0001] The invention relates to an improved radio frequency power supply for plasma discharge under atmospheric pressure. Background technique [0002] In recent years, because the plasma discharge under the atmospheric pressure has broken the limitation of the vacuum chamber, it not only reduces the cost of the equipment, but also is convenient to operate, not limited by the space, and it is easier to realize large-scale industrial production. Therefore, the stable low-temperature cold plasma under the atmospheric pressure The generation of jet and its application have aroused people's extensive attention. Since the breakdown voltage of plasma under radio frequency (excitation frequency 1 ~ 100MHz) is relatively low, and the discharge characteristics are relatively close to glow discharge under low pressure, the atmospheric pressure plasma discharge excited by radio frequency has been successfully applied in sterilization and surface treatment. and semicond...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H02M7/12H02M7/48H01F30/06H05H1/00
Inventor 李庆荣徐向宇卓慧锋李建华刘文革
Owner 李庆荣
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