Optical character testing device for mercury lamp case and testing method thereof
A testing device and technology for optical characteristics, applied in the field of optical characteristics testing devices for mercury lamp chambers, can solve the problems of inability to complete the test, high difficulty and the like
Active Publication Date: 2010-12-08
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology
According to the optical characteristics of the mercury lamp, the optical parameter test device of the mercury lamp is generally required to adapt to the test conditions of the light-on test, high power and non-point light source, so the optical parameter test of the mercury lamp is more difficult than the general optical test. Optical testing method and its device, unable to complete the test
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Abstract
The invention provides an optical character testing device for a mercury lamp case and a testing method thereof, and belongs to the field of optical measurement. The optical character testing device for the mercury lamp case comprises a shell, an aperture, a first optical collector, a first attenuating pad, a second optical collector, a four-quadrant detector, a blade and a collimating laser, wherein the aperture, the first optical collector, the first attenuating pad, the second optical collector and the four-quadrant detector are arranged in the shell in sequence; and the blade and the collimating laser are positioned in the shell. The testing device can be combined with a conventional positioning device, and can realize testing on three optical character parameters, namely focus, focuspower and focus light distribution of the mercury lamp case.
Description
technical field The invention belongs to the field of optical measuring devices, and in particular relates to an optical characteristic testing device of a mercury lamp lamp chamber and a testing method thereof. Background technique Photolithography (also known as micro-lithography) is used to manufacture semiconductor devices. Photolithography uses light waves of different wavelengths, such as ultraviolet, deep ultraviolet, or visible light, to project fine photolithographic patterns on silicon wafers, and further pass engraving Process methods such as etching form fine feature patterns on silicon wafers. Therefore, photolithography is a key link in the production of semiconductor devices. In addition to collimated lasers, light sources used in lithography include short-arc mercury lamps. Therefore, the optical characteristic parameters of the mercury lamp chamber are very important for the assembly and debugging of the lighting subsystem in the lithography machine. Among ...
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Patent Type & Authority Patents(China)
IPC IPC(8): G01M11/02G01J1/00
Inventor 张品翔胡斌黄玲
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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