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Immersion lithographic apparatus, drying device, immersion measuring apparatus and method of manufacturing the device

A lithography equipment and equipment technology, applied in microlithography exposure equipment, semiconductor/solid-state device manufacturing, optomechanical equipment, etc., can solve problems such as immersion liquid evaporation

Inactive Publication Date: 2009-11-11
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

While such systems improve substrate temperature control and handling, evaporation of the immersion liquid can still occur

Method used

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  • Immersion lithographic apparatus, drying device, immersion measuring apparatus and method of manufacturing the device
  • Immersion lithographic apparatus, drying device, immersion measuring apparatus and method of manufacturing the device
  • Immersion lithographic apparatus, drying device, immersion measuring apparatus and method of manufacturing the device

Examples

Experimental program
Comparison scheme
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Embodiment Construction

[0067] figure 1 A lithographic apparatus according to an embodiment of the invention is schematically shown. The lithography equipment includes:

[0068] - an illumination system (illuminator) IL configured to condition a radiation beam B (e.g., ultraviolet (UV) radiation or deep ultraviolet (DUV) radiation);

[0069] - a support structure (eg mask table) MT configured to support the patterning device (eg mask) MA and connected to first positioning means PM for precisely positioning the patterning device according to determined parameters;

[0070] - a substrate table (e.g. a wafer table) WT configured to hold a substrate (e.g. a resist-coated wafer) W and associated with a second positioning device configured to precisely position the substrate according to determined parameters PW connected; and

[0071] A projection system (eg a refractive projection lens system) PS configured to project the pattern imparted to the radiation beam B by the patterning device MA onto a tar...

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PUM

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Abstract

The invention discloses an immersion lithographic apparatus, a drying device, an immersion measuring apparatus and method of manufacturing the device. An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.

Description

technical field [0001] The present invention relates to a liquid removal device, in particular to a liquid removal device that can be used or combined with a photolithographic device or a measuring device, and also relates to a method for liquid removal and device manufacturing. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred by imaging the pattern onto a layer of radiation sensitive material (resist) provided on the substrate...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H01L21/02
CPCG03F7/70341G03F7/70916G03B27/52G03F7/70716G03F7/70933G03F7/2041H01L21/0274
Inventor M·瑞鹏N·R·凯姆波J·P·M·B·沃麦乌伦D·J·M·迪莱克斯D·M·H·飞利浦斯A·J·范普腾
Owner ASML NETHERLANDS BV