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Processing method for aluminium target material

A processing method and aluminum target technology, which is applied in metal material coating technology, ion implantation plating, coating, etc., can solve the problems of affecting the surface roughness of the surface texture and the easy deformation of aluminum, so as to achieve uniform force and not easy Vibration, the effect of reducing deformation

Active Publication Date: 2010-09-29
KONFOONG MATERIALS INTERNATIONAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The problem solved by the present invention is that in the prior art, when aluminum is processed to make a target, the aluminum is easily deformed, thus affecting the surface texture and surface roughness after processing

Method used

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  • Processing method for aluminium target material
  • Processing method for aluminium target material
  • Processing method for aluminium target material

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Embodiment approach

[0021] refer to figure 1 As shown, an embodiment of the processing method of the aluminum target of the present invention includes:

[0022] Step s1, fixing the aluminum workpiece with a full-circumference fixture, and performing the first machining;

[0023] Step s2, performing stress release on the aluminum workpiece;

[0024] Step s3, fixing the aluminum workpiece with a full-circumference fixture, and performing the second machining, the precision of which is higher than that of the first machining;

[0025] In step s4, the aluminum workpiece is fixed with a peripheral fixture, and the third machining is performed, the precision of which is higher than or equal to that of the second machining.

[0026] In the above embodiments, the first machining is rough machining, the purpose of which is to remove most of the margin of the aluminum workpiece to obtain a more regular semi-finished product, that is, to cut out the approximate shape of the target. The second machining i...

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Abstract

The invention relates to a processing method for an aluminium target material, which comprises the following step of processing three times of mechanical treatment with gradually-increased accuracy on an aluminium workpiece, wherein in the process of three mechanical treatment, a circumferential clamp is used for fixing the aluminium workpiece, and at least stress relief is preformed on the aluminium workpiece between the first mechanical treatment and the second mechanical treatment. The aluminium target material obtained by the processing method for the aluminium target material has good consistency of surface lines and low surface roughness.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a processing method for an aluminum target. Background technique [0002] The quality of thin films formed on substrates by sputtering methods can be affected by the surface roughness of the target used for sputtering. When protrusions with a size exceeding a certain level exist on the target surface, abnormal discharge (micro-arc discharge) may be generated on the protrusions. The abnormal discharge can cause large particles to be splashed from the surface of the target and deposited on the substrate. Deposited large particles can form spots on thin films and cause short circuits in semiconductor devices. [0003] Many materials can be used to make targets, including copper, aluminum, titanium, and more. In specific applications, the target material may include an alloy or a mixture of other metals, such as one or more of copper, aluminum, and titanium. Targets may...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C22F1/04C23C14/34C23C14/14
Inventor 姚力军潘杰王学泽鲍伟江刘庆
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD