Silicon-carbon separation method for polysilicon carbon head materials
A polysilicon carbon and separation method technology, applied in chemical instruments and methods, silicon compounds, inorganic chemistry, etc., can solve the problems of low separation efficiency, large loss of polysilicon, high cost of polysilicon, etc., to achieve complete separation, separation process safety, separation The effect of controllable efficiency
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Embodiment 1
[0011] Preparation of separation liquid: nitric acid with a mass concentration of 50% and sulfuric acid with a mass concentration of 98% are added in a weight ratio of 1:0.5 and mixed uniformly.
[0012] Silicon carbon separation: including silicon carbon separation, cleaning and surface treatment steps. The silicon carbon separation step is to put 50Kg polycrystalline silicon carbon head material into the mesh bag and put it into 100Kg separation liquid, mix it under airtight or ventilated conditions and fully soak it for 1 hour; the cleaning step is to take out the silicon carbon separation from the separation liquid After the polysilicon carbon head material, the powdered graphite is rinsed with water; the surface treatment step is to put the polysilicon that has been washed with water in the cleaning step to remove the graphite and soak it in a liquid alkali solution with a mass concentration of 5% for 5 minutes, and put it in a mass concentration after taking it out. Wash...
Embodiment 2
[0014] The separation liquid preparation method is with embodiment 1.
[0015] Silicon carbon separation: including silicon carbon separation, cleaning and surface treatment steps. The silicon carbon separation step is to put 100Kg of polycrystalline silicon carbon head material into a mesh bag and put it into 100Kg of separation liquid, mix it under airtight or ventilated conditions and fully Soak for 3 hours; the cleaning step is to take out the polysilicon carbon head material after the silicon-carbon separation from the separation liquid, and rinse the powdered graphite with water; the surface treatment step is to put the polysilicon with a mass concentration of 8 % liquid caustic soda solution for 8 minutes, take it out and put it into analytical pure hydrochloric acid solution with a mass concentration of 10% to wash for 3 minutes, and then rinse with deionized water until the surface pH is 5.0-7.0, which can fully realize the separation of polysilicon and graphite. sepa...
Embodiment 3
[0017] The separation liquid preparation method is with embodiment 1.
[0018] Silicon carbon separation: including silicon carbon separation, cleaning and surface treatment steps. The silicon carbon separation step is to put 200Kg of polycrystalline silicon carbon head material into a mesh bag and put it into 100Kg of separation liquid, mix it under airtight or ventilated conditions and fully Soak for 8 hours; the cleaning step is to take out the polycrystalline silicon carbon head material after silicon carbon separation from the separation liquid, and rinse the pulverized graphite with water; % of liquid caustic soda solution for 10 minutes, take it out and put it into an analytically pure hydrochloric acid solution with a mass concentration of 20% to wash for 5 minutes, then rinse with deionized water until the surface pH is 5.0-7.0, and the polysilicon and graphite can be fully bonded. separate.
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