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Radiation source

A technology of radiation source and radiation emission, which is applied in the field of radiation source and can solve problems such as damage

Active Publication Date: 2010-07-21
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Damage to the collecting mirrors may thus be minimized
However, even when using a buffer gas, some particles may still reach the collection mirror and cause damage to it

Method used

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Examples

Experimental program
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Effect test

Embodiment Construction

[0014] figure 1 A lithographic apparatus according to an embodiment of the invention is schematically shown. The lithography equipment includes:

[0015] an illumination system (illuminator) IL configured to condition a radiation beam B (e.g., extreme ultraviolet (EUV) radiation or extreme ultraviolet radiation);

[0016] a support structure (e.g. a mask table) MT configured to support a patterning device (e.g. a mask) MA and connected to a first positioning device PM configured to precisely position the patterning device MA according to determined parameters;

[0017] a substrate table (e.g. wafer table) WT configured to hold a substrate (e.g. a resist-coated wafer) W and associated with a second positioning device configured to precisely position the substrate W according to determined parameters PW connected; and

[0018] A projection system (eg a refractive projection lens system) PS configured to project the pattern imparted to the radiation beam B by the patterning de...

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PUM

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Abstract

A radiation source comprising a chamber and a supply of a plasma generating substance, the source having an interaction point at which the plasma generating substance introduced into the chamber may interact with a laser beam and thereby produce a radiation emitting plasma, wherein the source further comprises a conduit arranged to deliver a buffer gas into the chamber, the conduit having an outlet which is adjacent to the interaction point.

Description

technical field [0001] The invention relates to a radiation source, a method of generating radiation and a lithographic apparatus comprising the radiation source. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred by imaging the pattern onto a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate will contain a network of adjacent target portions that are successively patterned. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05G2/00
CPCH05G2/003H05G2/008
Inventor V·Y·班宁V·V·伊万诺夫
Owner ASML NETHERLANDS BV