Method and system for monitoring surface roughness of magnetic control spattering target
A surface roughness, magnetron sputtering technology, applied in sputtering coating, measuring device, metal material coating process, etc. Avoid product defects and other problems, and achieve the effect of reducing the probability of product defects and improving timeliness and efficiency
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[0023] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
[0024] figure 1 The flow chart of the method for monitoring the surface roughness of the magnetron sputtering target provided by the first embodiment of the present invention. like figure 1 As shown, the method for monitoring the surface roughness of the magnetron sputtering target in this embodiment includes:
[0025] Step 1. Before applying a voltage between the target and the substrate to coat the substrate, test the surface roug...
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