Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Zinc nitride and copper nitride compound of chiral alpha-phenylethylamine and use thereof

A technology of copper-nitrogen complexes and phenylethylamine copper-nitrogen, which is applied in the direction of copper organic compounds, zinc organic compounds, and preparation of amino compounds from amines, etc. It can solve the problems of unstable catalysts, large catalyst consumption, and difficulty in industrialization.

Inactive Publication Date: 2010-09-15
HEFEI UNIV OF TECH
View PDF1 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It has become one of the hot spots of research at home and abroad, and there have been a large number of reports in the literature. -Crafts) condensation reaction, Aldol (aldol) condensation reaction and many other reactions show good asymmetric catalytic activity and high enantioselectivity However, due to the limitations of the catalyst itself, for example, the catalyst is unstable in air , the amount of catalyst used is too large, the reaction is carried out at low temperature and other shortcomings, it is difficult to realize industrialization

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Zinc nitride and copper nitride compound of chiral alpha-phenylethylamine and use thereof
  • Zinc nitride and copper nitride compound of chiral alpha-phenylethylamine and use thereof
  • Zinc nitride and copper nitride compound of chiral alpha-phenylethylamine and use thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a zinc nitride and copper nitride compound of chiral alpha-phenylethylamine, which comprises a (S) alpha-phenylethylamine zinc nitride and copper nitride compound and a (R) alpha-phenylethylamine zinc nitride and copper nitride compound, which are prepared from the alpha-phenylethylamine, zinc acetate dihydrate, copper acetate monohydrate and copper chloride dihydrate and have the following formulas. In the formulas, ML is Zn(OOCCH3)2, Cu(OOCCH3)2 or CuCl2. The compound serves as a chiral catalyst in a Henry reaction.

Description

1. Technical field The present invention relates to a chiral compound and its use, specifically a zinc-nitrogen and copper-nitrogen complex of chiral α-phenylethylamine and its use. 2. Background technology Nitrogen-containing metal-organic complexes have novel structures and potential applications in catalysis, electrochemistry, adsorption, ion exchange, and magnetism. Researchers in chemistry, coordination chemistry, metal-organic chemistry and bioinorganic chemistry have paid extensive attention, and have achieved remarkable research results. 1. Kantchev, Eric Assen B.; O'Brien, Christopher J.; Organ, Michael G. Aldrichimica Acta, 2006, 39(4), 97-111. 2. Guillarme, S.; Whiting, A. Synlett (2004), (4), 711-713. 3. Pickin, Kerry A.; Kindy, Jennifer M.; Day, Cynthia S.; Welker, Mark E. Journal of Organometallic Chemistry (2003), 681(1-2), 120-133. 4. Bayer, A.; Gautun, Odd R. Tetrahedron: Asymmetry (2001), 12(21), 2937-2939. 5. Lee, Y.M.; Li, B. Hoveyda, A.H. Journa...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C07F3/06C07F1/08C07C211/65C07C209/68B01J31/22C07C201/06C07C205/16C07C205/04C07C205/32C07C205/26
Inventor 罗梅
Owner HEFEI UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com