Cleaning solution for dry plate developing tank and cleaning method thereof

A tank cleaning and dry plate technology, which is applied in photography, liquid processing equipment, optics, etc., can solve the problems of affecting the quality of dry plates, poor stability, and high risk of configuration, so as to prevent black spots or mildew spots and improve quality effect

Active Publication Date: 2010-10-13
SHENZHEN NEWWAY PHOTOMASK MAKING
View PDF6 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The process of developing with a developing tank loaded with developer is a chemical reaction process. After development, some black silver ions and strong oxidative residues will easily remain on the bottom and wall of the developing tank. If the cleaning is not clean, when the developing tank is used again , the black silver ions and strong oxidative residues remaining in the tank will be mixed in the developer, and aggregated on the surface of the dry plate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] After wearing anti-acid clothing, protective masks and latex gloves, pour the waste developer in the developing tank into a fixed container, and clean the developing tank with an appropriate amount of deionized water for 1 minute; take 1g of ammonium cerium nitrate and 10ml of perchloric acid 2. 25ml of deionized water is configured as a dry plate developing tank cleaning solution; extract the above cleaning solution and inject it into the developing tank and use a long-handled brush for cleaning. The cleaning time is within 2 minutes, and the waste cleaning solution is recycled into a 20-liter large bucket container; Add 10g of phosphorus-free cleaning agent, and rinse the developing tank with an appropriate amount of deionized water until there is no foam.

Embodiment 2

[0019] After wearing anti-acid clothing, protective masks and latex gloves, pour the waste developer in the developing tank into a fixed container, and clean the developing tank with an appropriate amount of deionized water for 1 minute; take 5g of ammonium cerium nitrate and 12ml of perchloric acid 1. 40ml of deionized water is configured as a dry plate developing tank cleaning solution; extract the above cleaning solution and pour it into the developing tank and use a long-handled brush for cleaning. The cleaning time is within 2 minutes, and the waste cleaning solution is recycled into a 20-liter large bucket container; Add 10g of phosphorus-free cleaning agent, and rinse the developing tank with an appropriate amount of deionized water until there is no foam.

Embodiment 3

[0021] After wearing anti-acid clothing, protective masks and latex gloves, pour the waste developer in the developing tank into a fixed container, and wash the developing tank with an appropriate amount of deionized water for 1 minute; take 8g of ammonium cerium nitrate and 15ml of perchloric acid 1. 75ml of deionized water is configured as a dry plate developing tank cleaning solution; extract the above cleaning solution and pour it into the developing tank and use a long-handled brush for cleaning. The cleaning time is within 2 minutes, and the waste cleaning solution is recycled into a 20-liter large bucket container; Add 10g of phosphorus-free cleaning agent, and rinse the developing tank with an appropriate amount of deionized water until there is no foam.

[0022] Adopt the cleaning solution in the above-mentioned embodiment to clean the black silver ions and strong oxidizing residues on the developing tank of the dry plate, all can be carried out repeatedly, and a circu...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a cleaning solution for a dry plate developing tank and a cleaning method thereof. The cleaning solution comprises the components of cerium ammonium nitrate, perchloric acid and de-ionized water; the ratio of the cerium ammonium nitrate, the perchloric acid and the de-ionized water is 1-13g:1-20ml:25-2000ml. The cleaning method for the developing tank comprises the following steps of: (1) draining the waste developing solution in the developing tank, cleaning the developing tank by the de-ionized water, and draining the waste solution after the cleaning operation is finished; (2) injecting the cleaning solution of the dry plate developing tank to the developing tank, cleaning the developing tank and recycling the waste cleaning solution after the cleaning operation is finished; and (3) adding the phosphate-free cleaning agent to the developing tank and washing the developing tank by the de-ionized water till no foam exists. The cleaning solution for the dry plate developing tank, provided by the invention, can rapidly and effectively remove black silver ions and strong oxidizing residues, thereby preventing black type or mildew type defects on the surface of the dry plate in the developing process.

Description

technical field [0001] The invention relates to a dry plate developing tank cleaning technology, more specifically, to a dry plate developing tank cleaning solution and a cleaning method. Background technique [0002] The developing tank refers to a special container for dry plate or other silver salt products to be developed and loaded with developing solution. The dry plate is a superfine silver salt glass plate commonly used in the mask plate industry to record graphics and text information. The process of developing with a developing tank loaded with developer is a chemical reaction process. After development, some black silver ions and strong oxidative residues will easily remain on the bottom and wall of the developing tank. If the cleaning is not clean, when the developing tank is used again , the black silver ions and strong oxidative residues remaining in the tank will be mixed in the developer, and aggregated on the surface of the dry plate during the development ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03F7/30G03D3/00
Inventor 杜武兵杨建平
Owner SHENZHEN NEWWAY PHOTOMASK MAKING
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap