Transmission-type GaN ultraviolet photocathode based on varied-doping structure and manufacturing method
A manufacturing method and transmissive technology, applied in circuits, electrical components, final product manufacturing, etc., can solve problems such as the inability to significantly improve cathode photoemission performance, achieve good long-wave ultraviolet response, improve transport efficiency, and improve surface The effect of escape chance
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[0023] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.
[0024] figure 1 It is a schematic structural diagram of a transmissive GaN ultraviolet photocathode based on a variable doping structure, as shown in the figure: a transmissive GaN ultraviolet photocathode based on a variable doping structure, the cathode is made of sapphire from bottom to top. The bottom layer 1, the Al N buffer layer 2, the p-type GaN photoemission layer 3 with a variable doping structure, and the Cs or Cs / O active layer 4, the doping concentration of the p-type GaN photoemission layer 3 is from the inner surface to the outside The surface is gradually lowered.
[0025] The p-type GaN photoemission layer 3 is epitaxially grown on the AlN buffer layer 2, and the p-type GaN photoemission layer 3 has a thickness of t 1 The corresponding doping concentration of the GaN layer is N A1 31, the thickness is t 2 The corr...
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