Transmission-type GaN ultraviolet photocathode based on varied-doping structure and manufacturing method
A transmissive, variable doping technology, which is applied in the manufacture of circuits, electrical components, and final products, can solve the problems of not being able to significantly improve the photoemission performance of the cathode, achieve good long-wave ultraviolet response, increase the probability of surface escape, The effect of improving transportation efficiency
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[0023] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.
[0024] figure 1 It is a schematic structural diagram of a transmissive GaN ultraviolet photocathode based on a variable doping structure, as shown in the figure: a transmissive GaN ultraviolet photocathode based on a variable doping structure, the cathode is made of sapphire from bottom to top. The bottom layer 1, the Al N buffer layer 2, the p-type GaN photoemission layer 3 with a variable doping structure, and the Cs or Cs / O active layer 4, the doping concentration of the p-type GaN photoemission layer 3 is from the inner surface to the outside The surface is gradually lowered.
[0025] The p-type GaN photoemission layer 3 is epitaxially grown on the AlN buffer layer 2, and the p-type GaN photoemission layer 3 has a thickness of t 1 The corresponding doping concentration of the GaN layer is N A1 31, the thickness is t 2 The corr...
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