Method for monitoring corrosion depth of silicon in real time
A corrosion depth, real-time monitoring technology, applied to the process, coating, microstructure device, etc. used to produce decorative surface effects, can solve problems such as difficulty in corrosion depth, corrosion uniformity deviation, corrosion rate fluctuations, etc., to achieve reduction Adverse effects, small effects of process complexity, effects of simplification of tools and operating steps
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[0030] The present invention will be further described in detail below in conjunction with the drawings and specific embodiments:
[0031] The embodiment of the present invention adopts a pre-patterned companion wafer to monitor the KOH corrosion depth of silicon, including the following steps:
[0032] 1. Grow a certain thickness of silicon oxide layer and silicon nitride layer on the substrate silicon substrate, and then conduct reactive ion etching to obtain the required corrosion depth monitoring pattern such as Figure 5 Shown. A companion piece includes four corrosion grooves 2 on its surface 1, each corrosion groove 2 includes four flanges 6, and each flange 6 includes two monitoring surfaces 4, so each corrosion groove 2 includes Eight monitoring lines 5. By designing the pattern of the mask, the Figure 5 A total of 16 flanges shown are made into the following widths (unit: microns): 100, 110,...,250.
[0033] The substrate used for the companion wafer is the same as the...
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