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Removal method of chromium residues on border of mask

A mask and edge technology, which is applied in the field of chromium residue removal on the edge of the mask, can solve the problems of missing graphics, infiltration, scrapping of the mask, etc., and achieve the effect of avoiding missing graphics and saving materials

Active Publication Date: 2010-12-22
SHENZHEN NEWWAY PHOTOMASK MAKING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the etchant is a liquid, it will inevitably spread during the wiping process. When this method is used to remove the chromium residue near the pattern, the etchant will penetrate into the pattern area, resulting in the loss of the pattern, resulting in the scrapping of the photomask

Method used

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  • Removal method of chromium residues on border of mask
  • Removal method of chromium residues on border of mask
  • Removal method of chromium residues on border of mask

Examples

Experimental program
Comparison scheme
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Embodiment Construction

[0015] The embodiment of the present invention provides a method for removing chromium residue on the edge of a photomask, which mainly includes: first placing an exposure document on the edge of the photomask material provided with a pattern area. Of course, the shape and quantity of the exposure document can be in accordance with the actual situation. Selection, for example, when the mask is square or rectangular, the corresponding exposure file can be rectangular or crescent shape, etc., and the chromium residues on the edges of the mask material may be the same or different. In this case, you can use the mask material Set the exposure file corresponding to the edge of one or more sides with chromium residue or severe chromium residue. In order to leave exposure traces on the edge of the illuminated material, the shape and size of the exposure file can be adopted according to the actual situation, but it is necessary to ensure that the exposure file is in the light The area w...

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Abstract

The embodiment of the invention relates to a removal method of chromium residues on the border of a mask. The method comprises the following steps of: firstly, arranging an exposure file on the border of a mask material with a graphic area, wherein the area of the exposure file is not stacked with the graphic area; then, exposing the exposure file in the exposure file area and a sensitive adhesive coated on the mask material; and finally, removing the sensitive adhesive on the border of the mask material according to an exposure track remained on the mask material when the chromium residues exist on the border of the mask material and also removing the chromium residues on the border of the mask material. By adopting method of the embodiment, the chromium residues on the border of the mask material can be removed, the problem of graphic miss brought by adopting an etching removal method through a chemical reaction is avoided, the mask quality is ensured against waste and the material and operation costs are saved.

Description

Technical field [0001] The invention relates to the field of electronic manufacturing, in particular to a method for removing chromium residue on the edge of a photomask. Background technique [0002] With the rapid development of the electronics industry, in the electronics manufacturing industry such as Liquid Crystal Display (LCD) and Integrated Circuit (IC), photomasks have become one of the indispensable and important molds, and their applications are increasing. The more extensive. The general photomask is called as follows: use soda glass or quartz glass as the substrate, coat a layer of chromium (Cr) on the surface to form a light-shielding layer, and then coat a layer of chromium oxide on the chromium layer, and finally Coat a layer of photosensitive glue on the surface of the chromium oxide layer, use the software to control the exposure device to carry out electron beam exposure or laser exposure, and then through a chemical reaction, that is, the photosensitive glue ...

Claims

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Application Information

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IPC IPC(8): G03F7/20G03F1/08G03F1/82
Inventor 杜武兵林伟邓阿庆
Owner SHENZHEN NEWWAY PHOTOMASK MAKING