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Metal optical grayscale mask and manufacturing method thereof

一种灰度掩模、金属的技术，应用在金属-金属氧化物体系光学灰度掩模及其制作领域，能够解决提高HEBS玻璃灰度掩模价格、很难大规模应用、生产成本高等问题，达到节省能源、制作过程快速、稳定性好的效果

Inactive Publication Date: 2012-05-09
THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the complex production, its production cost is very high, and it uses vacuum electron beam direct writing, which further increases the price of HEBS glass grayscale mask
Therefore, the above two kinds of grayscale masks are expensive and difficult to be applied on a large scale in industry

Method used

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  • Metal optical grayscale mask and manufacturing method thereof
  • Metal optical grayscale mask and manufacturing method thereof
  • Metal optical grayscale mask and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0056] The metal optical gray scale mask of the present embodiment is made of transparent substrate 12, and on transparent substrate 12 deposits one deck Sn metal thin film 11, and adopts laser direct writing method to make the gray scale of Fig. 1 composition at Sn metal thin film 11 mask; wherein, the transparent substrate 12 is quartz glass. The thickness of Sn metal thin film 11 is 5 or 20 nanometers; The laser power that adopts during laser direct writing is 1-5 milliwatts, and laser pulse width is 230 nanoseconds, and the sample moving step that adopts is 150 nanometers; In this Sn metal thin film 11, laser direct writing or direct writing through the substrate is performed on the surface of the metal thin film to make a metal optical grayscale mask as shown in FIG. 1 .

[0057] refer to Figure 1a ,right Figure 1a The preparation method of the metal optical grayscale mask is described:

[0058] First of all, choose ordinary glass, quartz sheet, crown glass or PC plast...

Embodiment 2

[0071] refer to Figure 2a and Figure 2b , deposit an In metal film 11 on a clean quartz substrate 12 with a DC magnetron sputtering method, for example, with a thickness of 50 nanometers. Then use the above-mentioned laser direct writing device to make a mask, and the laser power range corresponding to the above-mentioned thickness is 0.3-4 milliwatts, 1-10 milliwatts, and 1-70 milliwatts. The pulse width of the laser used is 100 nanoseconds, 1 micron, and 1 millisecond, and the step length of the sample moving stage is 50 nanometers, 200 nanometers, and 300 nanometers. Other specific production methods are the same as in Example 1.

Embodiment 3

[0073] refer to Figure 2b , on the quartz glass substrate 12, deposit a 2-nanometer thick Cr strengthening film by radio frequency magnetron sputtering, and then deposit a layer of InSn (atomic ratio 1: 1) metal thin film 11, for example, the thickness is 5, 20, 100 Nanometer; in the laser direct writing process, the corresponding laser power for making grayscale masks is 1-5 milliwatts, 1-4 milliwatts, and 1-20 milliwatts. Continuous laser writing is used, with a step size of 350 nanometers between lines. After the laser direct writing is finished, a layer of ZnS-SiO is deposited on the metal film 11 by radio frequency magnetron sputtering. 2 The protection layer 14, the thickness of the protection layer 14 is 100 or 200 nanometers. Other specific production methods are the same as in Example 1.

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Abstract

A metal optical grayscale mask includes a layer of metal film which is deposited on the transparent substrate, and different transparency pattern which is formed by laser writing on the surface of the metal film. The pattern is continuous, in type of array or random pattern. The grayscale is within 3.0-0.05D. The thickness of the metal film is 5-100 nm. A manufacturing method of the metal opticalgrayscale mask includes that the selected transparent substrate is rinsed by the general semiconductor rinse process, the metal film is deposited on the transparent substrate then different transparency pattern is formed by laser writing on the surface of the metal film. The pattern is continuous, in type of array or the random pattern. The grayscale mask is low in price, antistatic electricity performance is good, the resolution can surpass optical diffraction limit. The manufacturing method is simple. There is a wide band application for micro-optical components and large-scale production of micro-electro-mechanical systems.

Description

technical field [0001] The invention relates to an optical grayscale mask, in particular to a metal-metal oxide system optical grayscale mask manufactured by a laser direct writing method and a manufacturing method thereof. Background technique [0002] Optical grayscale masks can be used to make three-dimensional micro-nano structures, especially in the manufacture of micro-optical components, and it can also be used to make micro-electromechanical systems. Optical grayscale mask is a technology that realizes three-dimensional processing by changing the light transmittance at different positions on the mask, and then controlling the exposure intensity of the corresponding position on the resist during optical exposure. Currently the most successful grayscale mask technologies include analog grayscale masks and high energy beam sensitive (HEBS) glass. Among them, the analog grayscale mask is made by traditional photolithography method, and the light transmittance can be cha...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/62G03F1/48
CPCG03F1/54G03F1/58G03F1/144G03F1/50
Inventor 郭传飞刘前曹四海王永胜
Owner THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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