Method for adjusting real-time monitoring device in exposure light path of planar holographic grating
A flat holographic grating and real-time monitoring technology, which is applied in photoplate-making process exposure devices, microlithography exposure equipment, diffraction gratings, etc., can solve problems such as waste of resources and low efficiency, and achieve the effect of improving efficiency and technical level.
Inactive Publication Date: 2012-02-08
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Obviously, this method is not only inefficient, but also a waste of resources, which requires the establishment of a new method for adjusting the real-time monitoring device in the exposure light path of the planar holographic grating
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[0011] The present invention is implemented according to three method steps of step 1, step 2 and step 3 established in the technical solution to be solved. Among them, the light source laser 1 adopts Kr + Laser, the emission wavelength is 413.1nm; the first plane reflector 2 and the second plane reflector 3 are aluminized reflectors on glass substrates; the spatial filter 4 is composed of a microscopic objective lens and a pinhole; the collimating reflector 5 is made of K9 glass Base aluminized film off-axis parabolic reflector, aperture ф320mm, focal length 1200mm; third plane reflector 6 is K9 glass base aluminized film reflector, surface area 160mm×110mm, surface flatness better than 1 / 5λ, λ=632.8nm The grating substrate 7 is made of K9 optical glass, and the photoresist coated on the K9 optical glass is Japanese Shipley 1805 positive photoresist; the machine-engraved grating 9 is an aluminum-coated reflective plane diffraction grating that is mechanically carved; The mon...
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The invention relates to a method for adjusting a real-time monitoring device in an exposure light path of a planar holographic grating, belonging to a method for adjusting a real-time monitoring device used for making a planar holographic grating in the spectrum technology field and aiming to provide the method for adjusting a real-time monitoring device in the exposure light path of the planar holographic grating. The technical scheme comprises the following steps of: (1) establishing a set of planar holographic grating interference devices; (2) putting a machine-engraved grating with the reticle density identical to a holographic grating to be made in a position where a grating substrate needs to be placed and adjusting the machine-engraved grating to a position identical to the grating substrate by utilizing a Moire fringe phenomenon; and (3) illuminating a monitoring beam emitted by a -He-Ne laser on the machine-engraved grating and arranging an photovoltaic detector in the emergent light axis direction of diffraction light thereof. The method can rapidly and accurately adjust the real-time monitoring device in the exposure light path of the planar holographic grating and hasdirect important values in improving the technical level of light path adjustment and the efficiency.
Description
technical field [0001] The invention belongs to the adjustment method of a real-time monitoring device used in the exposure light path of a plane holographic grating related to the field of spectrum technology. Background technique [0002] In the exposure process of planar holographic gratings, obtaining a suitable exposure dose plays a decisive role in whether a qualified holographic grating can be produced, and using real-time monitoring to control exposure can solve this problem well. During the exposure process, a beam of He-Ne laser, which is not sensitive to photoresist, is irradiated on the grating substrate, and the intensity of the diffracted light will increase with the increase of the exposure amount. The appropriate exposure can be found by observing the change of the intensity of the diffracted light. stop moment. [0003] Since the latent image grating is formed after the photoresist is exposed, that is, the inside of the photoresist is a periodic change of t...
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IPC IPC(8): G02B5/18G03F7/20
Inventor 唐玉国孔鹏李文昊巴音贺希格齐向东
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI