Method for preparing molecular junction by polydimethylsiloxane stencil printing
A polydimethylsiloxane and stencil printing technology, used in the manufacture of microstructure devices, microstructure technology, microstructure devices, etc., can solve the problems of pattern structure deformation, influence of device yield, short circuit of upper and lower electrodes, etc. Avoid severe uncertainty, low-cost effects
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Embodiment 1
[0032] The steps of the method for preparing molecular knots by polydimethylsiloxane template printing are as follows.
[0033] (1) Cleaning the Si substrate
[0034] On the upper and lower sides of a pure Si(100) substrate, 250 nm thick SiO was grown at 1150 °C by dry oxygen oxidation 2 layer, the oxidation time is 5 hours. Dip the cut-sized Si substrate into the piranha solution at 65°C, take it out after 15 minutes, and then immerse it in deionized water, acetone and alcohol successively and clean it with ultrasonic wave for 4 minutes respectively.
[0035] Note: the piranha solution is pure H 2 SO 4 and H at a mass concentration of 30% 2 o 2 The mixture mixed at a ratio of 4:1 by volume is a highly oxidatively active corrosive solution that may react violently with organic materials. Operators should pay attention to physical protection (wear goggles, lab coats, rubber gloves and work in a chemical fume hood).
[0036] (2) Photolithography
[0037] Spin-coat positi...
Embodiment 2
[0053] The steps of the method for preparing molecular knots by polydimethylsiloxane template printing are as follows.
[0054] (1) Cleaning the Si substrate
[0055] On the upper and lower sides of a pure Si(100) substrate, 300 nm thick SiO was grown at 1200 °C by dry oxygen oxidation 2 layer, the oxidation time is 6 hours. Dip the cut-sized Si substrate into piranha solution at 80°C, take it out after 10 minutes, and then immerse it in deionized water, acetone and alcohol successively and clean it with ultrasonic wave for 5 minutes respectively.
[0056] Note: the piranha solution is pure H 2 SO 4 and H at a mass concentration of 30% 2 o 2 The mixture mixed at a ratio of 4:1 by volume is a highly oxidatively active corrosive solution that may react violently with organic materials. Operators should pay attention to physical protection (wear goggles, lab coats, rubber gloves and work in a chemical fume hood).
[0057] (2) Photolithography
[0058] Spin-coat positive r...
Embodiment 3
[0073] The steps of the method for preparing molecular knots by polydimethylsiloxane template printing are as follows.
[0074] (1) Cleaning the Si substrate
[0075] On the upper and lower sides of a pure Si (100) substrate, a 200nm thick SiO is grown at 1100°C by dry oxygen oxidation. 2 layer, the oxidation time is 4 hours. Dip the cut Si substrate into the piranha solution at 50°C, take it out after 20 minutes, and then immerse it in deionized water, acetone and alcohol successively and clean it with ultrasonic wave for 3 minutes respectively.
[0076] Note: the piranha solution is pure H 2 SO 4 and H at a mass concentration of 30% 2 o 2 The mixture mixed at a ratio of 4:1 by volume is a highly oxidatively active corrosive solution that may react violently with organic materials. Operators should pay attention to physical protection (wear goggles, lab coats, rubber gloves and work in a chemical fume hood).
[0077] (2) Photolithography
[0078] Spin-coat positive re...
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