Method for manufacturing electronic device and separation apparatus used therefor
A technology of electronic devices and manufacturing methods, applied in semiconductor/solid-state device manufacturing, electrical solid-state device, printed circuit manufacturing, etc.
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[0437] Example 1
[0438] The embodiments of the present invention will be described.
[0439] First of all, for the length 720mm, the width 600mm, the plate thickness 0.4mm, the linear expansion coefficient 38×10 -7 The supporting glass substrate (manufactured by Asahi Glass Co., Ltd., AN100, alkali-free glass substrate) at / °C was cleaned by pure water cleaning and UV cleaning.
[0440] Next, on the supporting glass substrate, 705mm in length and 595mm in width were coated with a screen printer (coating amount 30g / m 2 ) Silicone for solvent-free addition reaction type release paper (manufactured by Shin-Etsu Silicone Co., Ltd., KNS-320A, viscosity: 0.40 Pa·s, 100 parts by mass, and platinum-based catalyst (manufactured by Shin-Etsu Silicone Co., Ltd., CAT-PL-56) 2 parts by mass of the mixture.
[0441] Next, it was heated and cured in the atmosphere at 180°C for 30 minutes to obtain a silicone resin layer with a thickness of 20 μm on the surface of the supporting glass substrate.
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Example Embodiment
[0473] Example 2
[0474] In Example 2, a laminate B was produced in the same manner as in Example 1, except that the substrate was changed to a polyethylene terephthalate resin substrate with a thickness of 0.1 mm, and the same test as in the peeling test 3 was performed. As a result, the support and the polyethylene terephthalate resin substrate can be peeled off without damaging the laminate B. The charging voltage of the peeled polyethylene terephthalate resin substrate was +0.3 kV.
Example Embodiment
[0475] Example 3
[0476] In Example 3, a laminate C was produced in the same manner as in Example 1, except that the substrate was changed to a mirror-finished stainless steel (SUS304) substrate with a thickness of 0.1 mm, and the same test as in the peeling test 3 was performed. As a result, the support and the stainless steel substrate can be peeled off without damaging the laminated body C. The charging voltage of the stainless steel substrate after peeling was +0.02 kV.
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