Curable composition for transfer material and pattern formation method

A technology of curable composition and transfer material, which is applied in the photoengraving process of pattern surface, semiconductor/solid-state device manufacturing, nanotechnology for information processing, etc., and can solve the problems such as the use of resist materials that are not recorded

Inactive Publication Date: 2011-09-21
RESONAC HOLDINGS CORPORATION
View PDF8 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, although Patent Document 4 discloses that this material is useful as an optical material and a molded article, it does not describe its use as a resist material for imprinting at all.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Curable composition for transfer material and pattern formation method
  • Curable composition for transfer material and pattern formation method
  • Curable composition for transfer material and pattern formation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0131] Measure melamine 12.6g (0.1 mol), hydroxyethyl acrylate 78.1g (0.67 mol), paraformaldehyde 18.9g (0.6 mol), p-toluenesulfonic acid monohydrate 0.33g (1.74mL) in a 300mL 3-neck flask mol), p-methoxyphenol 20mg (1.61 mmol). The 3-necked flask was connected to a Liebig condenser equipped with an eggplant-shaped flask, and then the 3-necked flask was immersed in an oil bath set at 115° C., and dry air was passed through to make the mixture bubble, and it was stirred while making it reaction. As the reaction progressed, water began to accumulate in the eggplant-type flask attached to the Liebig condenser connected to the 3-necked flask. The reaction was carried out for 7 hours, and after confirming that the water in the reaction system could no longer be removed, the three-necked flask was lifted from the oil bath to complete the reaction.

[0132] Next, 950 parts by mass of propylene glycol monomethyl ether acetate, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1- 1.5 ...

Embodiment 2

[0134] To 50 parts by mass of the reaction solution obtained in Example 1, 950 parts by mass of propylene glycol monomethyl ether acetate and 1.5 parts by mass of dicumyl peroxide (manufactured by Percumil D NOF Co., Ltd.) were added to make This was dissolved and then filtered through a 0.2 μm filter to obtain a curable composition. 0.5 ml of the curable composition was dropped on a glass substrate set in a spin coater, and then the glass substrate was rotated at 500 rpm for 5 seconds, then at 3000 rpm for 2 seconds, and then at 5000 rpm for 20 seconds to coat the glass substrate. A thin film is formed on the substrate. The glass substrate coated with the curable composition to form a thin film on the surface was heated in an inert oven at 160° C. for 1 hour and at 250° C. for 1 hour under nitrogen gas flow. Then, the ion etching rate of argon gas and oxygen gas of the obtained resin film was measured by the method mentioned later.

Embodiment 3

[0136]Measure melamine 12.6g (0.1 mole), 2-hydroxypropyl acrylate 78.1g (0.6 mole), paraformaldehyde 18.9g (0.6 mole), p-toluenesulfonic acid monohydrate 0.33g ( 1.74 mmol), p-methoxyphenol 20 mg (1.61 mmol). The 3-necked flask was connected to a Liebig condenser equipped with an eggplant-shaped flask, and then the 3-necked flask was immersed in an oil bath set at 115° C., and dry air was introduced to make the mixture bubble, and it was stirred while making it reaction. As the reaction progressed, water began to accumulate in the eggplant-type flask attached to the Liebig condenser connected to the 3-necked flask. The reaction was carried out for 7 hours, and after confirming that water in the reaction system could no longer be removed, the three-necked flask was lifted from the oil bath to complete the reaction.

[0137] Then, 950 parts by mass of propylene glycol monomethyl ether acetate, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1-butane were added to 50 parts by m...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to view more

Abstract

Disclosed is a curable composition for a transfer material that is well suited to nanoimprinting, whereby ultrafine patterns to be used for a resist, etc., can be formed, and which has high dry etching resistance to argon gas, and high selectivity of dry etching speeds with argon gas and oxygen gas. The curable composition for a transfer material is characterized by containing a (meth) acrylate compound that possesses triazine skeleton obtained by causing a reaction between an aminotriazine compound, a compound that possesses a hydrocarbon group and a (meth) acryloyl group in the molecule thereof, and an aldehyde.

Description

technical field [0001] The present invention relates to an energy ray-curable or thermosetting curable composition for a transfer material used for pattern formation by imprinting, and a pattern forming method using the curable composition for a transfer material. Background technique [0002] Nanoimprint technology has attracted attention as a method for forming fine patterns in semiconductor manufacturing processes, magnetic recording medium manufacturing processes such as patterned media, and the like, and excellent transfer materials for this nanoimprint technology are required. [0003] Thermoplastic resins such as polymethyl methacrylate are generally used as transfer materials for nanoimprinting. In this case, the general process is to heat the coated material to a temperature above the glass transition temperature, perform embossing, and take it out after cooling. Lower the mold. However, such methods have the problems of being very time-consuming and having poor th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C08F20/34B05D1/28B05D1/38B05D3/00B05D3/06B05D7/24H01L21/027C08G12/40
CPCB82Y40/00G03F7/0758B82Y10/00G03F7/0002C08G12/40C08F220/34G03F7/0388G03F7/032B05D1/283H01L21/027
Inventor 新井良和内田博
Owner RESONAC HOLDINGS CORPORATION
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap