Method for manufacturing crystal grain assembly
A manufacturing method and grain technology, applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve problems such as the impact of output yield
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[0008] refer to Figure 1 to Figure 15 , is a schematic diagram showing various process steps of the manufacturing method of the die assembly of the present invention. refer to figure 1 , providing an upper wafer 10 and at least a lower wafer 20 . The upper wafer 10 and the lower wafer 20 have been tested, so they all have a wafer map (Wafer Mapping), wherein the upper wafer 10 has several known qualified upper crystal grains (Upper Known Good Die) 11 and several A known unqualified upper grain (Upper Known Bad Die) (not shown in the figure).
[0009] refer to figure 2 , the known qualified upper die 11 has a front side 111 , a back side 112 and several conductive structures 113 . The conductive structures 113 , such as bumps, are located on the front side 111 of the known good upper die 11 .
[0010] Then, cutting the at least one lower wafer 20 to form several lower crystal grains, these lower crystal grains include several known qualified lower crystal grains (Lower K...
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