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SiCf/Ti-based composite material 0/90-degree laminated thin plate with designable strength and weldability and preparation method thereof
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A composite material and sheet technology, which is applied in the field of SiCf/Ti matrix composite material 0/90° laminated sheet and its preparation
Inactive Publication Date: 2012-12-19
INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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[0006]In order to overcome the fact that the SiCf / Ti-based composite laminated sheet in the prior art is limited to one-way arrangement, the layer The anisotropic characteristics of the plywood are obvious, the types of Ti alloy matrix to be reinforced are very few, and the fiber distribution inside the material is not uniform. The purpose of the present invention is to provide a composite material whose strength can be designed and welded, which is densely combined and has a low degree of anisotropy. SiCf / Ti-based composite material 0 / 90° laminated sheet; another object of the present invention is to provide a controllable fiber volume fraction, the fibers are neatly arranged in the composite material, suitable for Preparation method of SiCf / Ti matrix composite 0 / 90° laminated sheet that strengthens most Ti alloy substrates and can design sheet strength
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Embodiment 1
[0049] SiC f The preparation steps and process of Ti-based composite material are as follows:
[0050] 1) Use alcohol to clean the surface of the continuous SiC fiber, then wind the fiber on the sample holder of the magnetron sputtering equipment, put it into the magnetron sputtering equipment, use TC17 alloy target material; mechanical pump, molecular pump pre-evacuation chamber, Vacuum degree better than 1×10 -3 After Pa, heat the vacuum chamber at 500-600°C and bake it. When the vacuum degree reaches the requirement, flow Ar gas into it, rotate the sample holder at a speed of 5-30 rpm, start the sputtering power supply, and start magnetron sputtering to produce SiC / TC17 pioneer wire, the target-base distance is 30mm, the single target sputtering power is 1500W, the magnetron sputtering time is 12 hours, after the sputtering is finished, it is lowered to room temperature, and the pioneer wire is taken out, the cross-sectional appearance is as follows image 3 As shown, th...
Embodiment 2
[0059] The difference from Example 1 is:
[0060] In step 1), a Ti55 alloy target is used, the sputtering power of magnetron sputtering is adjusted to 2000W, and a precursor wire is prepared. The diameter of the precursor wire is 170 μm, and the volume fraction of the fiber in the precursor wire is 35%;
[0061] In step 2), Ti55 alloy target is used, the sputtering power of magnetron sputtering is 2500W, the sputtering time is 15 hours, and the thickness of Ti55 foil is 100μm;
[0062] In step 4), the pioneer filament single-layer board is 70 (fiber direction) × 10mm 2And 10(fiber direction)×70mm 2 Cut into several small boards, and then use (0 2 , 90 2 , 0) 5 That is, (0, 0, 90, 90, 0, 0, 90, 90, 0, 0) two vertical layers, two horizontal layers, two vertical layers, two horizontal layers, and two vertical layers for a total of 10 layers. 10 layers are stacked in the same way, no Ti55 foil is added between the two interlaced single-layer boards, two layers of 100μm thick ...
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Abstract
The invention provides a SiCf / Ti-based composite material 0 / 90-degree laminated thin plate with designable strength and weldability and a preparation method thereof. The preparation method comprises: preparing SiCf / Ti-based composite material precursor wire which has uniform plating and contains 25 to 80 volume percent of SiC fibers by using a magnetron sputtering process; arranging the precursorwires to form a dense single-layer plate; determining the number of layers according to required strength, the type of selected Ti alloy and the volume percentage of SiC fibers, overlapping multiple layers of precursor wire plates in a 0 / 90-degree laminating method, and obtaining a prefabricated body, wherein the interlayer fill and the outer layer are both made of Ti alloy which is the same as the outer layer material of the precursor wires and the Ti foil covers the outside; and removing the bonding agent and combining by using hot pressing or hot isostatic pressing technique. The strength of the composite material can be designed, the volume percentage of the fibers in the laminated plate is controllable, the arrangement is almost as perfect as hexagonal compact stacking, the mechanical performance of the material is improved, and the 0 / 90-degree crossed laminating process solves the problem of low transverse performance of unidirectional laminated plates and improves the warping rigidity, transverse stiffness and impact resistance of the material.
Description
technical field [0001] The invention relates to the preparation technology of composite materials, specifically SiC with designable strength and weldable f / Ti-based composite material 0 / 90° laminated sheet and its preparation method. Background technique [0002] With the development of aviation and aerospace industries, higher requirements are put forward for engineering materials, such as low density, high strength, high modulus, high temperature resistance and so on. However, the performance of conventional Ti alloys and superalloys has been adjusted to the limit, so new high-temperature materials must be developed to meet the urgent needs of aviation, aerospace and other advanced technology industries. SiC f Compared with traditional Ti alloys, / Ti-based composite materials have higher specific strength, specific modulus, and better thermal stability, so they have become an important development direction of new high-performance space structural materials, and are exp...
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