Manufacturing method of color filter substrate and exposure mask for color filter substrate

A technology of color filter substrate and manufacturing method, which is applied to the photoplate-making process of the pattern surface, the original for photomechanical processing, optics, etc., to achieve the effect of sufficient correction effect

Active Publication Date: 2015-12-09
INESA DISPLAY MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The correction effect of this traditional optical proximity compensation method is limited. With the continuous reduction of the size of the spacer column PS, the influence of diffraction and diffraction is strengthened when the light passes through the small-sized opening on the mask, which makes the limitation of the optical proximity compensation method increasingly sexual

Method used

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  • Manufacturing method of color filter substrate and exposure mask for color filter substrate
  • Manufacturing method of color filter substrate and exposure mask for color filter substrate
  • Manufacturing method of color filter substrate and exposure mask for color filter substrate

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Embodiment Construction

[0034] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0035] Generally, the manufacturing process of the color filter substrate is divided into four steps.

[0036] The first step is to form a light-shielding pattern layer on a transparent substrate.

[0037] Introduced here is the realization of the pigment dispersion method: in this first step, first use a photosensitive composition (photoresist) to form a certain film thickness on a glass substrate through slit coating, and then use a hot plate to carry out 90 degrees Celsius , After 120 seconds of heating (preheating treatment), use a proximity exposure machine equipped with a high-pressure mercury lamp and a mask with a specified pattern, at 60mJ / cm 2 , Exposure GAP200μm conditional exposure. Afterwards, the development is carried out with a transport-type developing device, that is, the potassium hydroxide-based developer CDK-1 is a developer solut...

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Abstract

The invention discloses a manufacturing method of a color filter substrate and an exposure mask for the color filter substrate, which realize the effect of sufficient correction even if the shape of a small spacer column is used. The technical solution is as follows: the method includes: forming a light-shielding pattern layer on a transparent substrate; forming a color filter layer covering RGB photoresist on the surface of the transparent substrate where the light-shielding pattern layer is not formed; forming a light-shielding pattern layer and a color filter layer on the transparent substrate. A transparent conductive layer; forming a spacer column, using an exposure mask with a spacer column pattern in the exposure process for forming the spacer column, wherein the spacer column pattern is to add protrusions to the corners of the polygonal pattern and remove part of the side of the polygonal pattern .

Description

technical field [0001] The invention relates to a manufacturing method of a color filter substrate for a liquid crystal display device, in particular to a color filter substrate for a liquid crystal display device that corrects the shape of spacer columns to improve the conformity between the actual shape of the spacer columns and the design shape. Production Method. Background technique [0002] Liquid crystal display devices are rapidly spreading not only in the field of information and communication equipment but also in the field of general electrical equipment due to their portability and excellent display performance. This type of liquid crystal display device generally includes: an array substrate designed to have a plurality of pixel electrodes in a matrix on the first transparent substrate, and a second transparent substrate designed to have a plurality of light filters arranged corresponding to the pixel electrodes of the array substrate A pixel and a color filter...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1339G02F1/1333G03F1/36
Inventor 王菁晶金子若彦陈颖明张莉
Owner INESA DISPLAY MATERIALS
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