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Electrostatic Discharge Protection Device

A technology of electrostatic discharge protection and electrostatic discharge, which is applied in the direction of circuits, electrical components, electric solid devices, etc., can solve the problems of increasing the overall area of ​​components and failing to achieve high component density, and achieve the effect of high component density

Active Publication Date: 2015-12-16
SILICON MOTION INC (CN)
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] The technical problem to be solved by the present invention is that, in order to reduce the output impedance of the power cut-in element in the prior art to improve the effect of transmitting the ESD transient current, the overall area of ​​the element cannot be increased to achieve high element density. An electrostatic discharge protection device

Method used

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Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0041] Such as Figure 4a As shown, the ESD protection device 500 a in the embodiment of the present invention is disposed on a substrate 200 . The ESD protection device 500a includes a first doped region 202, a second doped region 204 and a third doped region 206 disposed in the first well region 208, wherein the first doped region 202 can be coupled to, for example, image 3 The power supply terminal VCC1 or the ground terminal GND1 of the first circuit 250a shown, and the second doped region 204 and the third doped region 206 can be correspondingly coupled to image 3 The power supply terminal VCC2 or the ground terminal GND2 of the second circuit 250b is shown.

[0042] For example, if the first doped region 202 is coupled to image 3 When the power supply terminal VCC1 of the first circuit 250a is shown, the second doped region 204 and the third doped region 206 are correspondingly coupled to the image 3 The power supply terminal VCC2 of the second circuit 250b is sho...

no. 2 example

[0049] Such as Figure 4b As shown, the first doped region 202 can also be located in the first well region 208 simultaneously with the second doped region 204 and the third doped region 206 . If the conductivity type of the substrate 200 is p-type, the electrostatic discharge protection device 500b can be regarded as having a first doped region 202 such as a p-type doped region, a first well region 208 such as an n-type well region, such as The third doped region 206 of the n-type doped region and the second doped region 204 such as the p-type doped region constitute a parasitic p-type-n-type-p-type junction bipolar transistor 500b.

[0050] Wherein the p-type first doped region 202 can be regarded as the emitter of the above-mentioned parasitic PNPBJT500b, the n-type first well region 208 and the n-type third doped region 206 can be regarded as the base of the above-mentioned parasitic PNPBJT500b respectively, and the p Type second doped region 204 can be regarded as the co...

no. 3 example

[0061] Since ESD may occur at the power supply terminal VCC1, it may also occur at the power supply terminal VCC2. Therefore, if Figure 4a or Figure 4b The ESD protection device 500a or 500b shown can be respectively connected in parallel with an ESD protection device conducting in the opposite direction to provide protection against ESD phenomena that may occur at the power supply terminal VCC1 or the power supply terminal VCC2.

[0062] Such as Figure 5a As shown, the electrostatic discharge protection device 500c is composed of an electrostatic discharge protection sub-device 500a1 connected in parallel with an electrostatic discharge protection sub-device 500a2 conducting in the opposite direction, wherein the electrostatic discharge protection sub-device 500a1 and 500a2 are connected with Figure 4a The illustrated ESD protection device 500a has exactly the same structure.

[0063] Such as Figure 5a As shown in FIG. Figure 4aThe first doped region 202 , the seco...

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Abstract

The invention relates to an electrostatic discharge protection device for providing an electrostatic discharge path between a first circuit and a second circuit, the electrostatic discharge protection device comprising a first doped region having a first conductivity type; a first well region, which has a second conductivity type opposite to that of the first conductivity type; a second doped region and a third doped region are located in the first well region, wherein the second doped region and the above-mentioned The third doped region has the first conductivity type and the above-mentioned second conductivity type respectively, wherein the first doped region is coupled to the power supply terminal or the ground terminal of the first circuit, and the second doped region Both the impurity region and the third doped region are correspondingly coupled to a power supply end or a ground end of the second circuit. The electrostatic discharge protection device of the invention provides an electrostatic discharge path for two interconnected circuits, and effectively protects the semiconductor device from the threat of ESD.

Description

technical field [0001] The present invention relates to circuit protection devices, and more particularly, to electrostatic discharge protection devices. Background technique [0002] During the process of manufacturing, processing, assembling, transporting, and using semiconductor devices, the entire process will be threatened by ESD (abbreviation for Electro-Static discharge, that is, electrostatic discharge). Without proper protective measures, semiconductor devices will be damaged and cannot be used. Sales. [0003] Such as Figure 1a As shown, the first power cut-in element 50 coupled between the two circuits 20a and 20b includes a first diode series module 52 and a second diode series module 54 connected in parallel with it in the opposite direction, wherein The first diode series module 52 is formed by connecting two first diodes 52a in series, and the second diode series module 54 is formed by connecting two second diodes 54a in series. [0004] The first power cut...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/04H01L29/73H01L23/60
Inventor 陈德威
Owner SILICON MOTION INC (CN)