Method for manufacturing X-ray diffraction optical element

Abstract

The invention discloses a method for manufacturing an X-ray diffraction optical element, which comprises the steps of: preparing a mask substrate A, wherein the mask substrate A is correspondingly provided with a plurality of segregated stripe-shaped lug bosses which correspond to the shape of an X-ray diffraction optical element to be prepared; spinning photosensitive photoresist on a nanometer impressing substrate B; taking the mask substrate A as a mask, so that a plurality of stripe-shaped grooves which are complemented with the stripe-shaped lug bosses are formed by impressing in the photosensitive photoresist; depositing a second metal material in the diffraction optical element-shaped stripe-shaped grooves on the nanometer impressing substrate B; and removing the residual photosensitive photoresist on the nanometer impressing substrate B, so that the diffraction optical element formed by the second metal material is formed on the nanometer impressing substrate B. Therefore, the preparation cost of the X-ray diffraction optical element is reduced, and the preparation period of the X-ray diffraction optical element is shortened.

Description

technical field [0001] The invention relates to the field of nanometer and optical technology in the microelectronics industry, in particular to a method for preparing an X-ray diffraction optical element. Background technique [0002] With the development of the field of diffractive optics, there are more and more demands for optical components. The traditional preparation technology of X-ray diffractive optical components is to prepare X-ray diffractive optical components by combining electron beam lithography and X-ray lithography. element. Due to the high cost of X-ray optical lithography, the cycle is long, and it is accompanied by certain radiation. This has a certain influence on the experimenters and restricts the mass production of X-ray diffraction optical elements. Moreover, the photoresist of X-ray lithography is cured at high temperature and developed, which will cause uneven side walls and uneven thickness of the photoresist, and the photoresist at the top of...

AI Technical Summary

Problems solved by technology

Due to the high cost of X-ray optical lithography, the cycle is long, and it is accompanied by certain radiation

This has a certain impact on the experimenters and restricts the mass production of X-ray diffraction optical elements

Moreover, the photoresist of X-ray lithography is cured at high temperature and developed, which will cause uneven side walls and uneven thickness of the photoresist. The photoresist at the top of the pattern presents an arc after development.

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