Film deposition system and method and gas supplying apparatus being used therein
A coating device and coating system technology, applied in transportation and packaging, gaseous chemical plating, metal material coating technology, etc., can solve the problems of inability to increase the delivery volume of precursors, production efficiency limitations, etc.
Inactive Publication Date: 2012-05-23
IND TECH RES INST
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Problems solved by technology
The carrier gas entering the pipeline transports the precursor to the microwave to increase the energy of the precursor itself, and then enters the coating device. This device can increase the reactivity, but it cannot increase the delivery amount of the precursor, and the production efficiency is limited.
Method used
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[0049] In order to enable your review committee to have a further understanding and understanding of the characteristics, purpose and functions of the present invention, the relevant detailed structure and design concept of the device of the present invention will be explained below, so that the review committee can understand the present invention The characteristics are described in detail as follows:
[0050] see figure 2 As shown, this figure is a schematic diagram of the coating system of the present invention. The coating system 3 includes a coating device 30 and a plurality of gas supply devices. The coating device 30 has a chamber 300 inside, and a heater 31 inside the chamber 300, which can support a substrate 32, such as a silicon substrate, a glass substrate, etc., but not limited thereto. Inside the chamber 300 and above the heater 31 is a precursor gas spraying module 33 connected to the plurality of gas supply devices. The gas spraying module 33 is mainly use...
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Abstract
The present invention provides a film deposition system and method and a gas supplying apparatus being used therein, wherein the film deposition system and method combines a plurality of gas supplying apparatuses and a deposition apparatus being in communication with the plurality of gas supplying apparatuses. By means of respectively providing different types of vapor precursors with high concentration and high capacity into a process chamber of the deposition apparatus through the plurality of gas supplying apparatus, the deposition reaction is accelerated so as to improve the efficiency of film deposition. In an embodiment of the gas supplying apparatus, it utilizes a first gas for providing high pressure toward on a liquid surface of the precursor, thereby transporting the precursor into an atomizing and heating unit whereby the precursor is atomized and then is heated so as to form a high-concentration and high capacity vapor precursor transported by another carrier gas.
Description
technical field [0001] The invention relates to a coating technology, in particular to a coating system and method for providing precursor gas in a coating manufacturing process and a gas supply device used therein. Background technique [0002] At present, the coating operation of the transparent conductive film of the solar cell is mostly completed by physical vapor deposition (PVD) or chemical vapor deposition (CVD). Those who use PVD coating usually carry out the surface treatment (texturing) of the film by etching. The production process is more complicated, and the plating rate of PVD is also low. For CVD coating operators, the precursor object is brought into the precursor object spraying module in the manufacturing process chamber by means of carrier gas. In this way, the supply concentration of the precursor object is low, and the coating speed is therefore low. [0003] Existing coating systems 1 such as figure 1 As shown, it has a coating device 10 and two gas s...
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IPC IPC(8): C23C16/455C23C16/448
CPCC23C16/4482C23C16/455C23C16/18C23C16/4486C23C16/448Y10T137/6416
Inventor 江铭通林士钦
Owner IND TECH RES INST