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Silicon wafer cleaning agent

A silicon chip cleaning agent and active agent technology, which is applied in the direction of detergent compounding agent, detergent composition, surface active detergent composition, etc., can solve the problems of long cleaning time, low cleaning yield rate, and occurrence of chips, etc. Achieve the effect of short cleaning time and excellent cleaning effect

Active Publication Date: 2014-03-19
JIANGSU XIEXIN SILICON MATERIAL TECH DEV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Conventional silicon wafer cleaning agents have the following disadvantages due to the formula: the cleaning time is long, usually 5-20 minutes, the cleaning effect is not ideal, and there will be flakes, that is, residue spots will appear on the surface of the silicon wafer after cleaning , more serious corrosion on the surface of the silicon wafer, etc.
For example, CN101020866A discloses a cleaning agent for solar silicon wafers. The cleaning effect of the cleaning agent is general, especially for the cleaning effect of metal impurities attached to the silicon wafer. The corrosion of the chip is serious, and the cleaning yield rate is reduced

Method used

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  • Silicon wafer cleaning agent
  • Silicon wafer cleaning agent

Examples

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Comparison scheme
Effect test

Embodiment 1

[0027] 1.5 kg of fatty alcohol polyoxyethylene (7) ether (AEO-7 produced by Xingtai Lanxing Auxiliary Factory) and perfluoroalkyl ethoxy ether alcohol (S-201 produced by Harbin Xuejia Fluorosilicone Chemical Co., Ltd.) 0.1 kg, 0.4 kg of ethylene glycol butyl ether, 0.4 kg of disodium edetate, 0.1 kg of maleic acid-acrylic acid copolymer (MA-AA produced by Shandong Taihe Water Treatment Co., Ltd.), 2 kg of potassium hydroxide Mix evenly with 5.5 kg of deionized water to make 10 kg of cleaning agent.

Embodiment 2

[0029] 2 kg of fatty alcohol polyoxyethylene (7) ether (AEO-7 produced by Xingtai Lanxing Auxiliary Factory), perfluoroalkyl ethoxy ether alcohol (S-201 produced by Harbin Xuejia Fluorosilicone Chemical Co., Ltd.) 0.1 kg, 0.4 kg of ethylene glycol butyl ether, 0.4 kg of disodium edetate, 0.1 kg of maleic acid-acrylic acid copolymer (MA-AA produced by Shandong Taihe Water Treatment Co., Ltd.), 2 kg of potassium hydroxide Mix evenly with 5 kg of deionized water to make 10 kg of cleaning agent.

Embodiment 3

[0031] 1.1 kg of fatty alcohol polyoxyethylene (7) ether (AEO-7 produced by Xingtai Lanxing Auxiliary Factory) and perfluoroalkyl ethoxy ether alcohol (S-201 produced by Harbin Xuejia Fluorosilicone Chemical Co., Ltd.) 0.1 kg, 0.3 kg of ethyl acetate, 0.4 kg of disodium edetate, 0.1 kg of maleic acid-acrylic acid copolymer (MA-AA produced by Shandong Taihe Water Treatment Co., Ltd.), 1.5 kg of potassium hydroxide and Mix 6.5 kg of ionized water evenly to make 10 kg of cleaning agent.

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Abstract

The invention discloses a silicon wafer cleaning agent. The silicon wafer cleaning agent comprises a surfactant, an auxiliary solvent, a metal complex, a suspending agent, a silicon wafer corrosive agent and water. The silicon wafer cleaning agent is characterized in that: the surfactant comprises a water-soluble fluorine-containing nonionic surfactant and an alcohol ether surfactant, wherein a weight ratio of the water-soluble fluorine-containing nonionic surfactant to the alcohol ether surfactant is 1:10-1:40. The silicon wafer cleaning agent of the present invention can not cause serious corrosion to the silicon wafer surface, and has excellent cleaning effect.

Description

technical field [0001] The invention belongs to the technical field of electronics industry cleaning, and relates to a cleaning agent, in particular to a silicon wafer cleaning agent. Background technique [0002] In the production process of photovoltaic and semiconductor silicon wafers, especially in the production process of solar silicon wafers used to manufacture solar cells, there are often some impurities attached to the surface of the silicon wafers, and the silicon wafers need to be cleaned to obtain qualified products. Solar silicon wafers are the basis for manufacturing solar cells, and its surface state will affect the reliability and yield of the cells, so the surface cleaning requirements for solar silicon wafers are relatively high. Conventional silicon wafer cleaning agents have the following disadvantages due to the formula: the cleaning time is long, usually 5-20 minutes, the cleaning effect is not ideal, and there will be flakes, that is, residue spots wil...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C11D1/825C11D3/60C11D3/30
Inventor 黄春来薛抗美朱战军陈龙胡亚兰
Owner JIANGSU XIEXIN SILICON MATERIAL TECH DEV