Anti-bubble liquid control device

Abstract

The invention discloses an anti-bubble liquid control device. The anti-bubble liquid control device is characterized by being arranged between a lens assembly and a substrate; a separation structure, a liquid seal belt and an auxiliary seal belt are arranged at the periphery of a liquid injection cavity and a recovering cavity, so that boundary bubbles are prevented from being generated while bubbles are brought away in the process of replacing maintenance liquid; liquid filled into the liquid injection cavity can be promoted to flow into the recovering cavity as much as possible through the separation structure; non-uniform liquid flow for promoting the liquid to gather inwards is applied at the periphery of the liquid injection cavity and the recovering cavity by the liquid seal belt according to the pressure distribution characteristic of a flow field, and the liquid seal belt has a leakage inhibition effect and a flowing traction effect; and the auxiliary seal belt is used for absorbing the liquid which can be leaked under the working condition of quick movement of the substrate and can apply certain liquid compensation to a boundary flow field. In addition, due to the application of the liquid which is the same as a medium in an observation area in the device, inter-infiltration and inter-diffusion among different fluid media can be prevented; and the device has high reliability and adaptability.

Description

technical field [0001] The invention relates to an anti-bubble liquid control device in an immersion microscope system, in particular to an anti-bubble liquid control device for an immersion microscope (Immersion Microscope). Background technique [0002] In industries such as semiconductors, fault analysis and reliability evaluation of tiny electronic devices are the key to ensuring yield. The usual way is to use the electronic device as a sample and observe it under a microscope to determine whether there are defects or impurities that affect the normal operation of the device. However, as the characteristic line width of electronic devices continues to shrink below 32 nanometers, and the size of substrates (such as semiconductor silicon wafers) continues to increase, the technical cost of traditional observation methods is rising rapidly. [0003] The immersion microscope system, by filling the gap between the front end of the objective lens and the substrate (such as si...

AI Technical Summary

Problems solved by technology

The method of dropping liquid on the observation area on the substrate first, and then moving the substrate to the bottom of the objective lens (for example, see Japanese patent JP2006243027A) can suppress the mixing of air bubbles to a certain extent, but it sacrifices work efficiency

[0007] 2) It is difficult to effectively control the bubble retention in the observation area

If bubbles appear in the liquid, they are easy to attach to the interface pollutants under the action of three-phase tension, which makes the bubbles exist for a long time and affects multiple observations, seriously reducing the reliability of the microscopic system

Adding the cleaning process of the objective lens after observation (for example, see Japanese patent JP2007065257A) will help to suppress pollution and reduce the retention of air bubbles, but it also reduces work efficiency and indirectly increases the cost of observation

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