Supply System Of Photoresist Stripping Solution And Supply Method Thereof

Abstract

The present invention discloses a supply system of a photoresist stripping solution and a supply method thereof. The supply system of the photoresist stripping solution comprises the following components: a first storage tank which is used for storing and supplying first photoresist stripping waste liquid; treating equipment which is used for receiving and treating the first photoresist stripping waste liquid from the first storage tank and respectively outputting photoresist stripping solution and second photoresist stripping solution; a second storage tank which is used for storing and outputting the photoresist stripping solution from the treating equipment; and a third storage tank which is used for storing the second photoresist stripping solution from the treating equipment. When the supply system is in a first operation period, the treating equipment outputs the second photoresist stripping waste solution into the first storage tank and stops outputting of the second photoresist stripping waste solution to a third storage tank; when the supply system is in a second operation period, the treating equipment outputs the second photoresist stripping waste solution into the third storage tank and stops outputting of the second photoresist stripping waste solution into the first storage tank.

Description

technical field [0001] The invention relates to a liquid supply system and its supply method, and in particular to a photoresist stripping liquid supply system and its supply method. Background technique [0002] In recent years, due to the advantages of light weight, small volume and low power consumption, etc., liquid crystal displays are widely used in various electronic products (such as televisions, mobile phones, notebook computers or satellite navigation devices, etc.). [0003] The process of liquid crystal display can be mainly divided into thin film transistor array (TFT Array) process, color filter (color filter) process, liquid crystal panel assembly (LC Cell Assembly) and liquid crystal panel module assembly (module Assembly). In the process, a photoresist is used on the substrate and undergoes processes such as exposure and development to form the desired circuit pattern on the substrate, while the unreacted photoresist is removed using a photoresist stripper d...

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Problems solved by technology

[0006] like figure 1 As shown, it can be found that the recovery efficiency of the photoresist stripper recovery equipment is poor before time point t1, that is to say, the recovery efficiency of the photoresist stripper recovery equipment is poor in the cold start stage, which may be due to the fact that the temperature has not yet reached The boiling point of the substance, so a considerable proportion of the photoresist stripping solution that can still be used is discharged with the waste liquid, resulting in the problem of a decrease in the recovery efficiency of the photoresist stripping solution and waste

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