Method for high-accuracy measurement of linear refractive index of material

A refractive index and high-precision technology, which is applied in the field of photonic materials and optical information processing, can solve the problems of expensive instruments and achieve the effect of simple optical path, high precision and fast test speed

Inactive Publication Date: 2012-08-01
SUZHOU MICRONANO LASER PHOTON TECH CO LTD
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Problems solved by technology

However, for thin film materials, the refractive index is mainly measured by ellip

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  • Method for high-accuracy measurement of linear refractive index of material
  • Method for high-accuracy measurement of linear refractive index of material
  • Method for high-accuracy measurement of linear refractive index of material

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Embodiment Construction

[0021] The present invention will be further described below in conjunction with accompanying drawing and embodiment:

[0022] figure 1 It is a diagram of the experimental setup of the 4f phase coherent imaging system applied to high-precision measurement of the linear refractive index of materials. The experimental setup can be divided into two parts, the measurement system and the reference system. The measurement system consists of an object to be measured 2 , a beam splitter 3 , a convex lens 4 , a nonlinear standard material 5 , a convex lens 6 , a neutral attenuator 7 and a CCD camera 8 . Wherein the neutral attenuation sheet 7 and the neutral attenuation sheet 12 are used to ensure that the CCD camera 8 is within its linear response operating range, the convex lens 4 and the convex lens 6 constitute a 4f system, and the object to be measured 2 is placed on the object surface of the 4f system. The linear standard material 5 is placed on the Fourier plane of the measure...

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Abstract

The invention discloses a method for high-accuracy measurement of a linear refractive index of a material, and belongs to the fields of photonics materials and optical information processing. The method can be used for performing high-accuracy measurement on the linear refractive index of an ultra-thin material, and comprises the following steps of: replacing a phase object in the conventional 4f system with a sample to be measured, and replacing a nonlinear sample to be measured in the conventional 4f system with a known optical nonlinear standard sample; performing numerical fitting on acquired reference faculae and nonlinear faculae, wherein only the linear refractive index of the sample to be measured is variable in the numerical fitting; and changing the value of the linear refractive index of the sample to be measured to ensure that simulated nonlinear faculae are inoculated with experimental nonlinear faculae, so that the linear refractive index of the material can be acquired very conveniently with a high accuracy. According to the method, an optical path is simple, data processing is performed conveniently, and the test speed is high, so the method can be widely applied in the research fields of measurement of the linear refractive index or thickness of the material, the photonics materials, the optical information processing and photonics devices.

Description

technical field [0001] The present invention relates to improving the original 4f phase coherent imaging system for measuring the optical nonlinearity of materials into a measurement method capable of measuring the linear refractive index of materials with high precision, and belongs to the field of photonic materials and optical information processing. Background technique [0002] The refractive index is one of the most important optical parameters of a medium. Refractive index measuring instruments have been widely used in manufacturing and scientific research fields. The working principle of commonly used refractive index measuring instruments is mainly based on light reflection (including total reflection), refraction, polarization, interference, etc. Early studies of this type focused on the physics of polarized light and its interaction with materials and the optics of instruments. In the past 30 years, the development of computer has enabled the application of elli...

Claims

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Application Information

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IPC IPC(8): G01N21/41
Inventor 宋瑛林杨俊义刘南春刘小波杨勇
Owner SUZHOU MICRONANO LASER PHOTON TECH CO LTD
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