Method for high-accuracy measurement of linear refractive index of material

Abstract

The invention discloses a method for high-accuracy measurement of a linear refractive index of a material, and belongs to the fields of photonics materials and optical information processing. The method can be used for performing high-accuracy measurement on the linear refractive index of an ultra-thin material, and comprises the following steps of: replacing a phase object in the conventional 4f system with a sample to be measured, and replacing a nonlinear sample to be measured in the conventional 4f system with a known optical nonlinear standard sample; performing numerical fitting on acquired reference faculae and nonlinear faculae, wherein only the linear refractive index of the sample to be measured is variable in the numerical fitting; and changing the value of the linear refractive index of the sample to be measured to ensure that simulated nonlinear faculae are inoculated with experimental nonlinear faculae, so that the linear refractive index of the material can be acquired very conveniently with a high accuracy. According to the method, an optical path is simple, data processing is performed conveniently, and the test speed is high, so the method can be widely applied in the research fields of measurement of the linear refractive index or thickness of the material, the photonics materials, the optical information processing and photonics devices.

Description

technical field [0001] The present invention relates to improving the original 4f phase coherent imaging system for measuring the optical nonlinearity of materials into a measurement method capable of measuring the linear refractive index of materials with high precision, and belongs to the field of photonic materials and optical information processing. Background technique [0002] The refractive index is one of the most important optical parameters of a medium. Refractive index measuring instruments have been widely used in manufacturing and scientific research fields. The working principle of commonly used refractive index measuring instruments is mainly based on light reflection (including total reflection), refraction, polarization, interference, etc. Early studies of this type focused on the physics of polarized light and its interaction with materials and the optics of instruments. In the past 30 years, the development of computer has enabled the application of elli...

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Problems solved by technology

However, for thin film materials, the refractive index is mainly measured by ellipsometer, and the accuracy can reach 5×10 -3 , but the instrument is more expensive

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