Positive resist composition, resist pattern forming method
A technology of positive-type resist and composition, which is applied in the field of positive-type resist composition, and can solve the problems of substrate cracking, large amount of resist, and ensuring interval time, etc.
Active Publication Date: 2016-08-03
TOKYO OHKA KOGYO CO LTD
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Problems solved by technology
[0004] In the coating method of dripping at the center and then spinning, good coating uniformity can be obtained, but, for example, in the case of a large substrate on the order of 1 m square, a considerable amount of resist is thrown away and discarded during rotation , In addition, the cracking of the substrate caused by high-speed rotation or the problem of ensuring the interval time
There is also the following problem: the coating performance in the method of rotating after dripping at the center depends on the rotation speed during rotation and the coating amount of resist, so it should be further applied to the larger fifth-generation substrate (1000mm× 1200mm~1280mm×1400mm), etc., there is no general-purpose motor that can obtain the required acceleration, and if such a motor is ordered, the cost of parts will increase
[0005] In addition, even if the size of the substrate or the size of the device is enlarged, the required performance in the coating process such as coating uniformity ±3%, interval time of 60 to 70 seconds / sheet will hardly change, so the method of rotating after the central drop Difficult to adapt to requirements other than coating uniformity
Method used
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Embodiment 1～7、 comparative example 1～5
[0145] The components shown in Table 1 were mixed and dissolved to prepare a positive resist composition.
[0146] [Table 1]
[0147]
[0148] The abbreviations in Table 1 have the following meanings. In addition, the numerical value in [ ] is compounding quantity (mass part).
[0149] (A)-1: take formaldehyde as condensation agent, use oxalic acid catalyst, utilize conventional method to make the mixed phenols of m-cresol / p-cresol=40 / 60 (feed molar ratio) carry out condensation reaction, the phenolic novolac obtained Novolac resins of Mw=5000 obtained by treating the varnish resins with a water-methanol mixed solvent, respectively.
[0150] (B)-1: the following compound (B)-1.
[0151] (C)-1: the following compound (C)-1.
[0152] (E)-1: BYK-310 (trade name, manufactured by BYK Chemicals).
[0153] (G)-1: 2-(2-hydroxyethyl)pyridine.
[0154] (S)-11: hexanediol.
[0155] (S)-12: 1,2-hexanediol.
[0156] (S)-13: 1,7-heptanediol.
[0157] (S)-14: benzyl alcohol.
[...
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Abstract
PROBLEM TO BE SOLVED: To provide a positive resist composition that can be suitably used for a discharge nozzle type coating method and to provide a method for forming a resist pattern using the positive resist composition.SOLUTION: The positive resist composition is used for a discharge nozzle type coating method including a step of applying a resist composition on the entire coating surface of a substrate by relatively moving a discharge nozzle and the substrate. The positive resist composition comprises an alkali-soluble novolac resin (A) and a naphthoquinone diazide group-containing compound (C), both dissolved in an organic solvent (S) containing a diol (S1) having 6 or more carbon atoms. The method for forming a resist pattern includes steps of: applying the positive resist composition on the entire coating surface of a support body by relatively moving a discharge nozzle and the support body; forming a resist film on the support body; exposing the resist film; and developing the resist film with an alkali to form a resist pattern.
Description
technical field [0001] The present invention relates to a positive resist composition suitable for a discharge nozzle coating method and a resist pattern forming method using the positive resist composition. [0002] This application claims priority based on Japanese Patent Application No. 2011-040168 for which it applied in Japan on February 25, 2011, and uses the content here. Background technique [0003] Conventionally, in the field of liquid crystal display element production using a small-sized glass substrate, the method of rotating after dripping in the center is used as a resist coating method (following non-patent document 1). [0004] In the coating method of dripping at the center and then spinning, good coating uniformity can be obtained, but, for example, in the case of a large substrate on the order of 1 m square, a considerable amount of resist is thrown away and discarded during rotation , In addition, there is a problem of cracking of the substrate due to ...
Claims
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IPC IPC(8): G03F7/039G03F7/00
CPCG03F7/004G03F7/022G03F7/039
Inventor 染谷和也山口敏弘青木知三郎
Owner TOKYO OHKA KOGYO CO LTD