Flexible-substrate-based nano-imprint template replication method

Abstract

The invention discloses a flexible-substrate-based nano-imprint template replication method, and belongs to a nano-imprint template in the technical field of nano-imprint. The method comprises the following steps of: imprinting a flexible substrate intermediate polymer sheet (IPS) to replicate a nano pattern by utilizing a primary template; sputtering a metal layer on one surface of the flexible substrate IPS with the nano pattern; and placing the IPS sputtered with the metal layer into an electroforming groove for micro-electroforming, and removing the IPS after micro-electroforming deposition is finished to finish the replication of the nano-imprint template. By the method, the shortcoming of incapability of depositing a nanostructure by directly utilizing the micro-electroforming is overcome; the replication of primary templates made from a plurality of materials and having a plurality of sizes can be finished, and replicated template patterns are high in resolution; the method comprises simple process steps, and is easy to operate, low in cost, short in manufacture cycle and suitable for batch production; and the replication of a large-area nano-imprint template can be finished.

Description

technical field [0001] The invention belongs to the technical field of nanoimprinting, and in particular relates to a method for replicating a nanoimprinting template based on a flexible substrate. Background technique [0002] Nano imprint lithography (Nano Imprint Lithography, NIL) is a new nano-pattern replication method first proposed by Dr. S.Chou of Princeton University in the 1990s, which uses the traditional principle of mechanical mold micro-replication It replaces the traditional complex optical lithography including optical, chemical and photochemical reaction mechanisms, avoiding the limitations and requirements of special exposure beam sources, high-precision focusing systems, extremely short-wavelength lens systems, and resist resolution by the half-wavelength effect of light. It is characterized by ultra-high resolution, high throughput and low cost. The biggest difference between nanoimprint lithography and traditional lithography lies in the nanoimprint tem...

AI Technical Summary

Problems solved by technology

Yoshihiko HIRAI of Osaka Prefecture University in Japan and others used electroforming technology to replicate silicon or silicon dioxide templates (Yoshihiko HIRAI, Satoshi HARADA, Satoshi ISAKA, Michio KOBAYASHI and Yoshio TANAKA. Nano-Imprint Lithography Using Replicated Mold by Ni Electroforming. Appl. Phys. 2002: 4186–4189), this process requires high electroforming technology, and at the expense of the original imprint template, the production cost is high, the efficiency is low, and it is not suitable for mass production

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