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Surface shape measurement method and surface shape measurement device

A surface shape and measurement device technology, applied in the direction of measurement devices, optical devices, instruments, etc., to achieve high-speed measurement and the effect of expanding the range

Active Publication Date: 2014-08-27
PANASONIC CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But, in fact, when moving preset interval size (sampling interval size) every time, utilize CCD camera 109 to shoot interference light, therefore, the obtained data group is as follows Figure 16 (b) is discrete

Method used

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  • Surface shape measurement method and surface shape measurement device
  • Surface shape measurement method and surface shape measurement device
  • Surface shape measurement method and surface shape measurement device

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Experimental program
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no. 1 approach

[0071] Figure 1A It is a schematic diagram showing the surface profile measuring device 1 of the first embodiment. First, the outline of the surface shape measuring device 1 will be described. The surface shape measurement device 1 includes: an optical system unit 4 that irradiates white light of a specific frequency band to the surface 3 of an object 2 to be measured and receives reflected light; and a control drive system unit 5 that controls and drives the optical system unit 4 ; The table 6 for placing the object to be measured 2. The object 2 to be measured is, for example, an aspheric lens, a circuit board, or the like. The optical system unit 4 includes a reference unit 7 . White light is also irradiated to this reference unit 7 . The details of the reference unit 7 will be described later, so the description is omitted here.

[0072] The surface shape measuring device 1 measures the in-plane ( Figure 1A The height information ( Figure 1A position along the Z ...

no. 2 approach

[0216] The structure itself of the surface profile measuring device of the second embodiment is substantially the same as that of the surface profile measuring device 1 of the first embodiment, and therefore description of the structure itself is omitted. Such as Figure 1E As shown, the CPU 16 has an operation control unit 16a and a calculation unit 16c. Only the calculation process of detecting the position of the surface to be measured 3 in the Z-axis direction by the calculation unit 16c of the CPU 16 based on the interference intensity signal is different from the first embodiment. Hereinafter, this arithmetic processing will be described.

[0217] By using the data captured by the camera 14 by the calculation unit 16c of the CPU 16, the nonlinear part k×s / λ in the formula (18) can be removed. The phase of the signal obtained from the interference intensity signal detected by each imaging element of the camera 14 is φ j , the average value of the phase obtained accordi...

no. 3 approach

[0229] The surface profile measurement device of the third embodiment is a surface profile measurement device in which the reference unit 7 of the surface profile measurement device 1 of the first embodiment is replaced with a reference unit 22 having a different structure. Hereinafter, only different structures will be described. Also, the first diffraction grating is a diffraction grating on which the reference light incident toward the reference unit is first incident. Furthermore, the second diffraction grating will be described as a diffraction grating into which the reference light enters after the first diffraction grating.

[0230] Figure 10 A reference unit 22 of the third embodiment is shown. In the reference unit 22 , the transmissive first diffraction grating 20 included in the reference unit 7 of the first embodiment is replaced with a reflective first diffraction grating 23 . Furthermore, in the reference unit 22 , the reflection-type second diffraction grati...

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Abstract

In this surface shape measurement method, white light (8A) containing different wavelengths is divided into reference light (8C) and measurement light (8B), the measurement light (8B) is incident on the surface to be measured ( 3 ), and the reference light (8C ) is incident on the first diffraction grating (20), and the reference light (8C) and the measurement light (8B) reflected from the surface to be measured (3) are synthesized as interference light (8D) to measure the surface to be measured (3) , wherein the reference light (8C) is incident from the first diffraction grating (20) to the second diffraction grating (21) through the first optical path, and then passes from the second diffraction grating (21) to the first optical path through the first optical path. Light incident on the diffraction grating (20) and emitted from the first diffraction grating (20).

Description

technical field [0001] The present invention relates to a surface profile measurement method and a surface profile measurement device using white interference. Background technique [0002] There is known a surface profile measuring device that measures the unevenness of precision processed products such as semiconductor wafers and glass substrates for liquid crystal displays by using interference of white light. use Figure 15 , and a conventional surface shape measuring device will be described (see Patent Document 1). [0003] In the conventional surface shape measurement device 100, white light from a white light source 101 is guided to a half mirror 103 through a first lens 102, and the white light reflected from the half mirror 103 is converged by a second lens 104. . Furthermore, the conventional surface profile measuring device 100 irradiates the converged white light to the surface to be measured 106 via the beam splitter 105 . The beam splitter 105 is a splittin...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B9/02G01B11/24
CPCG01B11/2441G01B9/02064G01B9/0209G01B9/02G01B11/24
Inventor 福井厚司追风宽岁
Owner PANASONIC CORP
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