Novel fractal pattern grounding shield structure
A pattern ground shielding and shielding structure technology, applied in the direction of electrical components, electric solid devices, circuits, etc., can solve the problems of reducing the Q value of the inductor/transformer, reducing the L value of the inductor coil, and the energy loss of the substrate, so as to reduce the area, Increased working frequency, easy to achieve effect
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[0025] The present invention will be further described below in conjunction with accompanying drawing.
[0026] figure 1 It is a schematic plan view of an embodiment in which the first-order H-shaped fractal ground shielding structure of the present invention is applied to an inductor, such as figure 1 As shown, the inductance line 11 is wound from the top metal of the semiconductor substrate 10 (such as a silicon substrate), the inductance lines 12a and 12b are wound from the next top metal of the semiconductor substrate 10, and the inductance lines 11 and 12 are separated by air, and S is the distance between metal coils. In the central part of the inductor is an H-shaped first-order ground shielding basic unit 13 made of the underlying metal layer M1. The construction details of the basic unit 13: first select a center point, construct the horizontal metal strip with the length L and the width W in the middle of the H figure, the starting point is -L / 2, -W / 2, and the end ...
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