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Cleaning agent for removing stains on surface of silicon slice

A silicon chip surface and cleaning agent technology, applied in the field of cleaning agent, achieves the effect of simple preparation process, low cost and convenient operation

Inactive Publication Date: 2014-01-01
JIANGSU UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to develop a cleaning agent for stains on the surface of monocrystalline silicon and polycrystalline silicon for the current cleaning problems

Method used

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  • Cleaning agent for removing stains on surface of silicon slice
  • Cleaning agent for removing stains on surface of silicon slice
  • Cleaning agent for removing stains on surface of silicon slice

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Polyvinyl alcohol derivative 40%,

[0022] Octylphenylpolyoxyethylene Phosphate 30%,

[0023] OP 1%,

[0024] Sodium Lauryl Thioacetate 20%,

[0025] Water 9%.

[0026] The above-mentioned proportioning components are placed in a stirrer and stirred evenly, and then filled and packaged.

Embodiment 2

[0028] Polyvinyl alcohol derivative 20%,

[0029] Octylphenylpolyoxyethylene Phosphate 50%,

[0030] OP 3%,

[0031] Sodium Lauryl Thioacetate 20%,

[0032] Water 7%.

[0033] The above-mentioned proportioning components are placed in a stirrer and stirred evenly, and then filled and packaged.

Embodiment 3

[0035] Polyvinyl alcohol derivative 30%,

[0036] Octylphenylpolyoxyethylene Phosphate 45%,

[0037] OP 3%,

[0038] Sodium Lauryl Thioacetate 17%,

[0039] Water 5%.

[0040] The above-mentioned proportioning components are placed in a stirrer and stirred evenly, and then filled and packaged.

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Abstract

The invention discloses a cleaning agent for removing stains on the surface of a silicon slice. The cleaning agent is prepared from 20-40% of polyving akohol derivant, 30-50% of p-alkyl polyoxyethylene octyl phosphates, 1-3% of OP, 15-30% of dodecyl sodium thioglycolate and 2-10% of water. According to the invention, the preparation process is simple; the cost is low; the cleaning agent is used for cleaning the stains on the surfaces of monocrystalline silicon and polycrystalline silicon; the operation is convenient; the decontamination is fast, and the effect is good. Meanwhile, the cleaning agent has the effects of preventing stains from being formed on the surfaces of the monocrystalline silicon and polycrystalline silicon.

Description

technical field [0001] The invention belongs to the technical field of cleaning agents, and relates to a cleaning agent for removing stains on the surface of silicon wafers. The cleaning agent can remove the stains formed on the surface of polycrystalline and monocrystalline silicon on the solar surface. Background technique [0002] With the development of monocrystalline silicon and polycrystalline silicon slicing technology, more and more attention has been paid to the recovery of silicon rod cutting fluid. However, the flocculated substances produced by the cutting fluid recycled many times are due to the oxidation and deterioration of polymer materials and the increase of metal ions in the solution. It will be deposited on the surface of the cut monocrystalline silicon or polycrystalline silicon, causing stains and difficult to remove, thus affecting the quality of solar monocrystalline silicon and polycrystalline silicon. Therefore, there is an urgent need to develop ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C11D1/83
Inventor 高延敏
Owner JIANGSU UNIV OF SCI & TECH
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