Solar thin film battery and manufacturing method thereof
A solar thin film and manufacturing method technology, applied in the direction of final product manufacturing, sustainable manufacturing/processing, circuits, etc., can solve problems such as bending and surface damage, and achieve the effects of thinning thickness, cost saving, and not easy to bend
Active Publication Date: 2015-04-01
盐城正泰新能源科技有限公司
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- Application Information
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Problems solved by technology
[0006] The purpose of the present invention is to provide a solar cell and its manufacturing method, to solve the problem of serious surface damage after RIE texturing, adopt aluminum oxide and silicon nitride layer passivation on the back of the solar cell, improve the passivation effect, and avoid sintering bending phenomenon
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[0031] The technical solution of the present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments, and the following embodiments do not constitute a limitation of the present invention.
[0032] Partial sectional view of solar thin film battery of the present invention is as figure 1 As shown, it includes a substrate 100, an intrinsic layer 106 located on the front surface of the substrate 100 where light is incident, a doped layer 105 located on the intrinsic layer 106, and an anti-reflection conductive film layer covering the doped layer 104; the passivation layer 107 located on the rear surface opposite to the front surface of the substrate 100 and without incident light, the silicon nitride film layer 108 on the passivation layer 107, located outside the silicon nitride film layer 108 and The back aluminum layer 109 penetrates deep into the substrate 100 through the silicon nitride film layer 108 and the passivat...
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Abstract
The invention discloses a solar thin film battery and a manufacturing method thereof. The solar thin film battery adopts a crystal silicon wafer as a substrate; the front face is subjected to annealing treatment to form an alpha-Si: H passivation layer; an amorphous silicon thin film layer covers to repair and passivate defects generated by carrying out RIE (Reactive Ion Etching) at the front side, and inherent defects in crystal silicon and on the surface of the crystal silicon to form a good p-i-n structure on the front face; photo-generated current can be better collected by utilizing TCO to cover the surface; the back face is passivated by Al2O3, and a SixNy layer and a back aluminum layer cover the back face, so as to protect an Al2O3 layer to be not damaged in a sintering process; and defects on the back face can be better passivated, so that when the structure is sintered, the structure is not easy to bend; and the thickness of a thin silicon wafer can be reduced and the cost of the battery is greatly reduced.
Description
technical field [0001] The invention relates to the technical field of solar thin film batteries, in particular to a solar thin film battery and a manufacturing method thereof. Background technique [0002] When non-renewable energy sources such as electricity, coal, and oil are running out frequently, and energy issues have increasingly become a bottleneck restricting the development of the international society and economy, more and more countries have begun to implement the "Sunshine Plan" to develop solar energy resources and seek new impetus for economic development. Solar energy is an inexhaustible renewable energy source for human beings, and it is also a clean energy source that does not produce any environmental pollution. Therefore, solar energy has developed rapidly in recent years. Crystalline silicon solar cells have become the most commonly used and mass-produced solar cells due to their low production costs, stable output power and long service life (20 to 40...
Claims
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IPC IPC(8): H01L31/075H01L31/0376H01L31/0216H01L31/18H01L31/20
CPCY02E10/50Y02E10/548Y02P70/50
Inventor 杨玮亮李云峰韩玮智牛新伟
Owner 盐城正泰新能源科技有限公司