Heating device and plasma processing equipment

A heating device and processing equipment technology, applied in the direction of discharge tubes, electrical components, circuits, etc., can solve the problems of increasing the cost of sealing treatment, cumbersome sealing process, etc., and achieve the effect of reducing equipment maintenance time, improving processing quality, and improving use efficiency

Active Publication Date: 2016-06-08
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In order to seal the reaction chamber, the four wiring holes 12 need to be sealed separately, which not only increases the cost of the sealing process, but also the sealing process is cumbersome

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Heating device and plasma processing equipment
  • Heating device and plasma processing equipment
  • Heating device and plasma processing equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] In order for those skilled in the art to better understand the technical solution of the present invention, the heating device and the plasma processing equipment provided by the present invention will be explained in detail below in conjunction with the accompanying drawings.

[0032] It should be noted that the lower surface of the first base mentioned below refers to the downward surface when the first base is placed horizontally, and correspondingly, the upper surface of the first base refers to the upward surface when the first base is placed horizontally.

[0033] figure 1 For the sectional view of the heating device provided by the present invention, figure 2 The bottom view of the heating device provided by the present invention without the second base. Please also refer to figure 1 and figure 2 , the heating device provided by the present invention includes a first base 1, a second base 2 and a resistance wire 4, wherein the first base 1 and the second bas...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a heating device and plasma processing equipment. The heating device comprises resistance wires, a first base and fixing parts, and the resistance wires are fixed on the first base by the aid of the fixing parts. By the aid of the fixing parts, the resistance wires can be prevented from deviating from preset positions and guaranteed to be uniformly distributed on the first base all the time, and the resistance wires can maintain the same stretch factor, so that heating uniformity of the heating device is improved, and the service life of the heating device is prolonged. The temperature in a reaction chamber of the plasma processing equipment is uniform, and processing quality of processed workpieces can be improved.

Description

technical field [0001] The invention belongs to the field of vacuum technology, and relates to a heating device and plasma processing equipment. Background technique [0002] With the rapid development of electronic technology, the competition among production enterprises is becoming more and more fierce, which requires the production enterprises to continuously improve their product quality to cope with the fierce market competition. As we all know, the processing performance of production equipment is one of the main factors affecting product quality. For example, the processing performance of LED (light emitting diode) etching machine affects the quality of LED light source. [0003] During the etching process of the LED etching machine, many by-products will be produced in the reaction chamber, which will have an adverse effect on the etching quality of the substrate and the life of the etching machine. For this reason, a lining and a heating device are installed in th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/02H01J37/32
Inventor 宋俊超
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap