Flexible substrate treatment device
A flexible substrate and processing device technology, which is applied in the field of flexible substrate processing devices, can solve problems such as processing time changes, and achieve the effect of improving quality and ensuring uniformity
Active Publication Date: 2012-11-21
BOE TECH GRP CO LTD
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Problems solved by technology
[0006] The embodiment of the present invention provides a flexible substrate processing device, which solves the problem that the processing time of the existing roll-to-roll etching device changes with the change of the diameter of the winding roller when processing the flexible substrate
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[0015] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0016] The present invention provides a flexible substrate processing device, such as figure 2 as shown ( figure 2 The case of only one tank is shown), the device includes: at least one tank 22 containing the treatment liquid 21; the winding roller above the treatment liquid 21 includes a driving roller 23 and a driven roller 24 Positioning rollers 25 located in each of the treatment liquids 21; Detection unit 26, used to detect the radius or diameter of the at ...
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The embodiment of the invention discloses a flexible substrate treatment device, which relates to the technical field of semiconductor manufacturing and solves a problem that treatment time changes with the change of the diameter of a winding roller when a conventional reel-to-reel etching device treats a flexible substrate. According to the embodiment of the invention, after detecting the change of the radius or the diameter of the winding roller, a detection unit can notify a drain outlet position control mechanism or a liquid compensation component to regulate a movable drain outlet to a higher position and compensate a treatment liquid, or regulate the drain outlet to a lower position to facilitate the drain of partial treatment liquid, therefore, according to a certain proportion, the length of the flexible substrate immersed in the treatment liquidcan change with the change of the radius and the diameter of the winding roller via the lifting of the liquid level of the treatment liquid, treatment time of the flexible substrate in the treatment liquid is constant, size uniformity of components on the flexible substrate is ensured and the quality of flexible display products can be improved.
Description
technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a flexible substrate processing device. Background technique [0002] With the continuous development of flexible display products, the roll-to-roll (Roll to Roll) process, with its low-cost and high-efficiency production characteristics, will gradually replace the sheet-by-sheet production mode currently used in the manufacture of non-flexible display products and become the future display product The mainstream of production. [0003] figure 1 A schematic diagram of a roll-to-roll etching device used in the prior art, including: an etching tank 12 containing an etching solution 11; a winding roller positioned above the etching tank, including a driving roller 13 and a driven roller The roller 14 ; the positioning roller 15 located in the etching solution 11 ; the flexible substrate 16 bypasses the driven roller 14 , the positioning roller 15 and the drivin...
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IPC IPC(8): H01L21/67
CPCH01L21/67057H01L21/67086C23G3/021H05K1/0393B08B3/041B08B3/08
Inventor 周伟峰
Owner BOE TECH GRP CO LTD