Rotating device for reaction chamber

Abstract

The invention discloses a rotating device for a MOCVD (metal organic chemical vapor deposition) unit. The rotating device comprises a spindle (1). The spindle is hermetically disposed on a lower flange through a magnetic fluid seal plate (2) to fully isolate the inside of the reaction chamber from the outside. The rotary spindle (1) is connected with a motor (4) through a magnetic fluid seal device (3). The upper end of the spindle (1) is axially and coaxially provided with a through hole extending to the end face of the lower flange. The upper end of the rotary spindle is provided with pores in quincuncial form. The pores are communicated with the axial through hole. The lower flange is provided with a nitrogen inlet (5) which is communicated with the bottom of the axial through hole of the spindle. The reaction chamber is fine in airtightness, the rotary spindle is less easy to thermally deform, and a carrier plate is stable in dynamic balance.

Description

technical field [0001] The present invention relates to the technology of preparing semiconductor thin film, especially relates to a kind of equipment used for MOCVD [0002] The rotating device of the response room. Background technique [0003] Metal-organic Chemical Vapor Deposition (MOCVD for short) is a key technology for preparing compound semiconductor thin films. The MOCVD reaction chamber is the place where the source material is epitaxially grown on the substrate. It has a great influence on the uniformity of the thickness of the epitaxial layer, the composition, the concentration of background impurities and the yield of the epitaxial film. Therefore, in the design process of the reaction chamber There are many factors that must be considered, among which the disc rotation device is one of the core components. The following problems exist in the existing disc rotating device: [0004] 1. The rotation of the loading tray is carried out in a high-temperature, sea...

AI Technical Summary

Problems solved by technology

[0004] 1. The rotation of the loading tray is carried out in a high-temperature, sealed, and clean reaction chamber. The pump effect generated by the high-speed rotation of the tray is used to suppress the convective vortex, so that the substrates in all directions on the loading tray can get a more uniform reaction Source particle concentration supply, but since the crystal growth temperature in the MOCVD system reaches 500-1200 ° C, the variable speed rotation of the high temperature tray is easy to damage the high sealing performance of the reaction chamber

[0005] 2. The rotating spindle rotates at high speed for a long time in a high temperature environment, which is prone to thermal deformation, resulting in unstable dynamic balance of the substrate tray. Although the substrate rotates with the tray, only the atmosphere and thermal field that are constantly changing can be obtained.

Images