Dual-sided processing method and exposure device
A technology of exposure device and double-sided process, which is applied in photoplate-making process exposure device, micro-lithography exposure equipment, pattern-surface photoplate-making process, etc., can solve the problems of difficult alignment and low product yield, and achieve Improve efficiency, position accuracy, and ensure quality
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[0032] The specific embodiments of the present invention will be described in detail below in conjunction with the drawings.
[0033] In the existing double-sided manufacturing process, it is difficult to recognize the substrate alignment mark and the yield of the finished product is low. Therefore, in order to solve this problem, the design of the double-sided process exposure device is mainly required by Alignment processing, and then make the double-sided graphics of the substrate respectively.
[0034] This embodiment provides a double-sided manufacturing method and exposure device in the manufacturing process of semiconductors and liquid crystal displays. During the exposure operation, such as figure 1 with figure 2 As shown, the double-sided manufacturing method includes the following steps:
[0035] S1: According to actual needs, the two masks 1 used in the double-sided manufacturing process are aligned.
[0036] The alignment processing of the mask 1 can be manually adjusted ...
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