Method for measuring optical constants of thin film with non-uniform refractive index

A measurement method and thin-film optical technology, applied in the application field of deep-ultraviolet thin-film optical technology, can solve problems such as complex mathematical calculation and model dependence.

Inactive Publication Date: 2013-03-20
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

However, the mathematical calculation of the ellipsometric method is complicated, and it is more depende...

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  • Method for measuring optical constants of thin film with non-uniform refractive index
  • Method for measuring optical constants of thin film with non-uniform refractive index
  • Method for measuring optical constants of thin film with non-uniform refractive index

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Embodiment Construction

[0022] The present invention relates to obtaining the optical constants of the film with non-uniform refractive index by combining the respective advantages on the basis of comparative analysis of photometry and ellipsometry to form a hybrid algorithm, thereby improving the analytical accuracy of the film's optical constants in the deep ultraviolet band .

[0023] The method for measuring the optical constant of the non-uniform refractive index film of the present invention:

[0024] First, the spectroscopic measurement will be performed on the film substrate prepared under specific process conditions, and the influence of the weak absorption of the substrate in the deep ultraviolet band on the film needs to be considered;

[0025] Secondly, in the measurement of the transmittance and reflectance spectra of the film and the measurement of the ellipsometric parameters at different angles, the test band is selected from 185nm-450nm, and the ellipsometric test angles are respecti...

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Abstract

The invention relates to a method for measuring optical constants of a thin film with a non-uniform refractive index. The method comprises the following steps: perfomring spectral measurement on transmissivity and reflectivity of the thin film to obtain spectral measurement data; performing variable-angle ellipsometry on the thin film to obtain ellipsometric parameters; and fitting the spectral data and the ellipsometric parameters, matching with a corresponding dispersion relation, and working out the optical constants of the thin film by using a non-uniform model. On the basis of separate use of the photometry and the ellipsometry, respective advantages of the photometry and the ellipsometry are flexibly taken, high sensitivity of measuring optical parameters of a film layer by the ellipsometry and intuition of measuring data by the photometry are fully played, and the photometry and the ellipsometry are combined with each other to obtain high-precision analytical data of the optical constants, so that the reliance of the photometry on the thickness of the thin film is improved and the difficulty for model calculation by the ellipsometry is reduced.

Description

technical field [0001] The invention relates to the application field of deep ultraviolet thin film optical technology, in particular to a method for measuring the optical constant of a non-uniform refractive index thin film. Background technique [0002] In recent years, as the ArF excimer laser has been widely used and developed in many fields such as material fine processing, deep ultraviolet lithography, material processing and excimer medical treatment, the research on deep ultraviolet optical related technologies has important social and social significance. Economic Value. In the field of deep ultraviolet, whether it is ArF excimer laser or other related optical systems, it is inseparable from coated optical components in the deep ultraviolet range. Therefore, it is urgent to develop optical films with excellent performance in the deep ultraviolet range. [0003] In order to prepare thin-film optical elements that meet the requirements, it is necessary to accurately ...

Claims

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Application Information

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IPC IPC(8): G01M11/02
Inventor 金春水常艳贺李春邓文渊靳京城
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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