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Varifocal photoetching objective lens system

A lithography objective lens and zoom technology, applied in the field of optics, can solve the problem that the same lithography objective lens cannot expose mask exposure patterns of different scales and sizes, etc., and achieves short optical total length, small aperture, and reduces processing difficulty. and the effect of manufacturing costs

Active Publication Date: 2013-03-27
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to solve the problem that the existing lithography objective lens is a fixed-focus system, and the same lithography objective lens cannot be used to expose different scale mask exposure patterns, the present invention provides a zoom lithography objective lens system

Method used

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  • Varifocal photoetching objective lens system

Examples

Experimental program
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Effect test

Embodiment 1

[0041] Embodiment 1: as figure 1 As shown, the present invention provides a kind of refraction zoom lithography objective lens system working at a wavelength of 410nm according to the structure of zoom1, which is used to image the pattern of the object plane O on the image plane I, which is composed of 22 optical lenses, From the object plane to the image plane, the lenses are marked as L1~L22. The 22 optical lenses are divided into G1~G5 groups according to their power and their functions in the system of the present invention. The distribution of power is from the object plane to the image. The planes are positive-negative-positive-negative-positive in turn, the distance from the object plane to the image plane is 805mm, the largest lens in the system has a full aperture of less than 153mm, the F number of the image side is 2, the numerical aperture of the image side is 0.2, and the magnification is 0.25. The size is 14.8mm.

[0042] The specific structure of the zoom litho...

Embodiment 2

[0059] Such as Figure 5 As shown, the structure diagram of the present invention at the zoom position zoom2, such as Figure 6 As shown, the transfer function graph of the optical system at the zoom position zoom2, such as Figure 7 As shown, the graph of the transfer function when the defocus is 1μm, such as Figure 8 As shown, field curvature and distortion graphs.

Embodiment 3

[0061] Such as Figure 9 As shown, the structure diagram of the present invention at the zoom position zoom3, such as Figure 10 As shown, the transfer function graph of this optical system, such as Figure 11 As shown, the graph of the transfer function when the defocus is 1μm, such as Figure 12 As shown, field curvature and distortion graphs.

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Abstract

The invention relates to a varifocal photoetching objective lens system, belongs to the technical field of optics and solves the problem that mask plate exposure patterns different in proportion cannot be exposed by a same existing photoetching objective lens. The varifocal photoetching objective lens system sequentially comprises an object surface, a first lens group, a second lens group, a third lens group, a fourth lens group, a fifth lens group and an image surface from the object surface to the image surface. The object surface is a plane where a mask plate is located, the first lens group is used for fixing the distance between the object surface and a first lens of the varifocal system, the second lens group functions in changing the focal of a photoetching objective lens and the size of the image surface, the third lens group functions in compensating moving of the image surface during moving of a zoom group so as to enable the image surface to be kept fixed during zooming, the fourth lens group is provided with a negative power, a fifth lens group is provided with a positive power, the fourth lens group and the fifth lens group form a rear fixing group which is used for guaranteeing constant distance between the last lens, close to one side of the image surface, of the photoetching objective lens and the image surface, and the image surface is a plane where an etching substrate is located.

Description

technical field [0001] The invention belongs to the field of optical technology, and in particular relates to a zooming photolithography objective lens system. Background technique [0002] The lithography device is a very important equipment in the lithography technology of the modern high-resolution integrated circuit manufacturing process. The lithography objective lens system is a crucial core component in lithography equipment. Lithography devices are mainly divided into two types: masked lithography devices and maskless lithography devices according to whether or not a mask is used. Most of the two lithography methods use projection lithography exposure. The masked lithography device projects the exposure pattern information on the mask onto the etched substrate; the maskless lithography device projects the exposure pattern information of the spatial light modulator onto the etched substrate, and the etched substrate is processed by developing, etc. The complex proce...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B15/173G03F7/20
Inventor 刘伟奇吕博冯睿魏忠伦柳华康玉思姜珊
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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