Dust-free and environment-friendly chalk and preparation method thereof

A kind of technology for chalk and environmental protection, which is applied in the direction of pencil lead, household utensils, applications, etc. It can solve the problem that the reduction effect of chalk dust pollution is not very obvious, and achieve the effect of improving the teaching environment, expanding the scope, and fluent chalk writing

Inactive Publication Date: 2015-02-25
XIANGSHAN XINGQI ELECTRICAL APPLIANCE TECH
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It just adds grease or polyalcohols to ordinary chalk as a binder, and then adds fillers with a larger specific gravity, such as clay, marl, cement, etc., which can increase the specific gravity and volume of chalk dust, making it easy to clean. Scattering, but in practical applications, its effect on reducing chalk dust pollution is not very obvious

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0013] The content of the present invention is made by the following weight and number ratios,

[0014] 30 parts of titanium dioxide, 20 parts of calcium sulfate, 15 parts of stearic acid, 10 parts of soybean oil, 5 parts of paraffin, 1 part of talcum powder, and 1 part of red iron oxide.

[0015] The preparation method of the present invention is that the above-mentioned raw material components are mixed and then added to the reaction kettle, and stirred for 2 hours at a temperature of 330° C., then the raw materials in the reaction kettle are injected into the chalk forming mold, and after cooling the forming mold , cured to obtain the finished product.

Embodiment 2

[0017] The content of the present invention is made by the following weight and number ratios,

[0018] 40 parts of titanium dioxide, 15 parts of calcium sulfate, 25 parts of stearic acid, 5 parts of soybean oil, 10 parts of paraffin, and 5 parts of talcum powder.

[0019] The preparation method of the present invention is that the above-mentioned raw material components are mixed and added to the reaction kettle, and stirred for 1 hour at a temperature of 300 ° C, and then the raw materials in the reaction kettle are injected into the chalk forming mold, and after cooling the forming mold , cured to obtain the finished product.

Embodiment 3

[0021] The content of the present invention is made by the following weight and number ratios,

[0022] 35 parts of titanium dioxide, 18 parts of calcium sulfate, 20 parts of stearic acid, 8 parts of soybean oil, 8 parts of paraffin, 3 parts of talcum powder, and 1 part of tartrazine.

[0023] The preparation method of the present invention is that the above-mentioned raw material components are mixed and added to the reaction kettle, and stirred for 1.5 hours at a temperature of 320 ° C, and then the raw materials in the reaction kettle are injected into the chalk forming mold, and after cooling the forming mold , cured to obtain the finished product.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention belongs to the field of formula and preparation of chalks, and in particular relates to a dust-free and environment-friendly chalk and a preparation method thereof. The chalk is prepared from the following components in parts by weight: 30 to 40 parts of titanium white powder, 15 to 20 parts of calcium sulfate, 15 to 25 parts of stearic acid, 5 to 10 parts of bean oil, 5 to 10 parts of paraffin, 1 to 5 parts of talc powder, and 0 to 1 part of pigment. The chalk does not contain toxic or volatile substances, does not have toxicity or smell, is environment-friendly, and is beneficial to improvement of a teaching environment.

Description

technical field [0001] The invention belongs to the field of chalk formula and its preparation, in particular to a dust-free environment-friendly chalk and a preparation method thereof. Background technique [0002] Chalk is a tool widely used in daily life and is generally used for writing on blackboards. Ancient chalk was usually made of natural chalk, but nowadays it is replaced by other substances. The composition of chalk is a white precipitate of calcium sulfate, which is not easily decomposed, and the particles are larger than dust. Now, the chalk of domestic use mainly contains two kinds of common chalk and dust-free chalk, and its main component is calcium carbonate (limestone) and calcium sulfate (gypsum), or contains a small amount of calcium oxide. [0003] According to measurements, at present, in our country's schools, there are more than 70,000 particles per square meter of classrooms, which exceeds the maximum limit by more than 6 times. These dusts are inh...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C09D13/00
Inventor 赵立地
Owner XIANGSHAN XINGQI ELECTRICAL APPLIANCE TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap