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Method for measuring tilt aberration of Hartmann wavefront sensor subaperture

A sub-aperture and sensor technology, which is applied in the field of measuring tilt aberration in the sub-aperture of Hartmann wavefront sensor, can solve the problems of precision and dynamic range limitation, and achieve improved sensitivity and signal-to-noise ratio, high-precision wavefront detection, and improved Effect of Wavefront Probe Velocity

Active Publication Date: 2013-05-15
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

In this extreme case, although a higher wavefront detection speed can be achieved, the detection accuracy and dynamic range have been greatly limited.

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  • Method for measuring tilt aberration of Hartmann wavefront sensor subaperture
  • Method for measuring tilt aberration of Hartmann wavefront sensor subaperture
  • Method for measuring tilt aberration of Hartmann wavefront sensor subaperture

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[0024] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0025] Before describing the present invention, the basic knowledge of Walsh function and Zernike is explained.

[0026] The optical wavefront aberration is actually the spatial distribution state of the phase, which can be expressed theoretically by a complete and orthogonal function sequence. Zernike polynomials are classic wavefront aberration expansions. Zernike polynomials are not only completely orthogonal in circular domains, square domains, etc. The distribution coincides, for example, the 0th-order Zernike polynomial represents the overall phase shift, the 1st-order Zernike polynomial represents the x-direction tilt of the phase, the 2nd-order Zernike polynomial represents the y-direction tilt of the phase, and t...

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Abstract

Disclosed is a method for measuring tilt aberration of Hartmann wavefront sensor subaperture. First-step Walsh function form binary phase modulation and second-step Walsh function form binary phase modulation are respectively conducted to auxiliary optical waves in an auxiliary aperture range through a phase modulator, modulated auxiliary optical waves each time are focused by a micro lens and enter into corresponding single mode fiber lectotype filter, three types of light intensity data emerged in three states of non-modulation, first-step modulation and second-step modulation are received by a single detector at the other end of an optical fiber, a first-step Walsh function coefficient and a second-step Walsh function coefficient of wavelet center front are obtained according to the light intensity data, and tilt aberration coefficients in two directions corresponding to the wavelet center front in the auxiliary subaperture are obtained by utilizing a corresponding proportional relation of the first-step Walsh function and the second-step Walsh function and tilt aberration. The method for measuring the tilt aberration of the Hartmann wavefront sensor subaperture reduces the number of corresponding detecting units of each subaperture sufficiently, greatly reduces detection information content, achieves that in each single subaperture, a single photoelectric detector replaces a photoelectric detector array, accelerates detecting speed and reduces device cost, and meanwhile, detecting precision of wavefront is free from the influence of reduction of the number of the detecting units.

Description

technical field [0001] The invention relates to a method for measuring oblique aberration, in particular to a method for measuring oblique aberration in the sub-aperture of a Hartmann wavefront sensor. Background technique [0002] Wavefront phase measurement is the core problem of optical detection technology and adaptive optics technology, which is mainly solved by measuring wavefront with various wavefront sensors. Among them, the Hartmann wavefront sensor is one of the most popular and widely used wavefront sensors. Chinese Patent Application Publication (Application No. 98112210.8, Publication No. CN1245904A) discloses a Hartmann wavefront sensor. Its implementation mainly uses a microlens array to divide the light aperture into many sub-apertures, and the incident light wave is divided into many sub-apertures. Sub-light waves, each sub-light wave is focused by a corresponding microlens onto a photodetector array (such as a CCD or CMOS camera) to form a light spot. By...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01J9/00
Inventor 王帅杨平许冰刘文劲雷翔晏虎董理治高源程生毅
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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