Electric conduction bulge-equipped semiconductor device, packaging structure and manufacture method
A conductive bump and semiconductor technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, semiconductor/solid-state device components, etc., can solve problems such as empty soldering in the peripheral area, short circuit in the center area of the chip, open circuit, etc., to avoid bridging short circuit , improve the yield and prevent the effect of empty welding
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no. 1 example
[0056] Such as Figure 5A As shown, a substrate 501 having a bonding pad 502 on its surface is provided, and the substrate 501 also has a protective layer 503 covering its surface and exposing part of the surface of the bonding pad 502 . The substrate referred to in the embodiments of the present invention may be a wafer, a chip or a circuit board, or even any substrate used for soldering.
[0057] Such as Figure 5B As shown, a metal layer 504 is formed on the surface of the protection layer 503 and the exposed pad 502 by sputtering.
[0058] At Figure 5C and Figure 5D In the shown steps, a first resistive layer 505 is formed on the metal layer 504 , and a first opening 506 corresponding to the position of the solder pad 502 is formed.
[0059] At Figure 5E In the shown step, a first conductive pillar 507 is formed by electroplating on the surface of the metal layer 504 in the first opening 506 .
[0060] At Figure 5F and Figure 5G In the steps shown, a second re...
no. 2 example
[0067] Such as Figure 6A As shown, there is provided a substrate 601 with a bonding pad 602 on its surface, and the substrate 601 also has a protective layer 603 covering its surface and exposing part of the surface of the bonding pad 602 .
[0068] Such as Figure 6B As shown, a metal layer 604 is formed on the surface of the protection layer 603 and the exposed pad 602 by sputtering.
[0069] Such as Figure 6C and Figure 6D As shown, a first resistive layer 605 is formed on the metal layer 604 , and a first opening 606 corresponding to the position of the solder pad 602 is formed. As shown in FIG. 6D', the first resistive layer 605 covers part of the surface of the metal layer 604, and generally, the size of the first opening 606 is smaller than the area of the pad 602.
[0070] Such as Figure 6E and Figure 6E ’, a first conductive post 607 is formed on the surface of the metal layer 604 in the first opening 606, so that the first conductive post 607 constitutes...
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