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Power distortion-based servo control systems for frequency tuning RF power sources

A radio frequency system, frequency technology, applied in the direction of automatic power control, improving amplifiers to reduce nonlinear distortion, high-frequency amplifiers, etc., can solve problems such as phase information minimization of reverse power

Active Publication Date: 2013-07-03
MKS INSTR INC
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Phase information is not utilized in this scheme to minimize reverse power

Method used

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  • Power distortion-based servo control systems for frequency tuning RF power sources
  • Power distortion-based servo control systems for frequency tuning RF power sources
  • Power distortion-based servo control systems for frequency tuning RF power sources

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Embodiment Construction

[0038] The foregoing description is merely illustrative in nature and is not intended to limit the disclosure, its application, or uses in any way. The broad teachings of the disclosure can be implemented in a variety of forms. Therefore, while this disclosure includes particular examples, the true scope of the disclosure should not be so limited since other modifications will become apparent upon a study of the drawings, the specification, and the following claims. For purposes of clarity, the same reference numbers will be used in the drawings to identify similar elements. The phrase at least one of A, B, and C as used herein should be understood to mean a logical (A or B or C) using a non-exclusive logical or. It should be understood that one or more steps within a method may be executed in different order (or concurrently) without altering the principles of the present disclosure.

[0039]Here, the term "module" may refer to or include an application-specific integrated ...

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Abstract

A radio frequency system includes a power amplifier (20) that outputs a radio frequency signal to a matching network (14) via a transmission line (18) between the power amplifier (20) and the matching network (14). A sensor monitors the radio frequency signal and generates first sensor signals (33) based on the radio frequency signal. A distortion module (44) determines a first distortion value according to at least one of (i) a sinusoidal function of the first sensor signals (33) and (ii) a cross-correlation function of the first sensor signals (33). A first correction circuit (46) (i) generates a first impedance tuning value based on the first distortion value and a first predetermined value, and (ii) provides feedforward control of impedance matching performed within the matching network (14) including outputting the first impedance tuning value to one of the power amplifier (20) and the matching network (14).

Description

technical field [0001] The present disclosure relates generally to radio frequency (RF) generators, and more particularly to frequency control of RF generators. Background technique [0002] The background description provided herein is for the purpose of generally presenting the context of the disclosure. The work of the presently named inventors, so far as the work is described in this Background section, and aspects of the description that may not be prior art at the time of filing, are neither expressly nor impliedly admitted to be prior art to the present disclosure. [0003] Plasma etching is often used in semiconductor manufacturing. In plasma etching, an electric field is used to accelerate ions to etch exposed surfaces on a substrate. The electric field is generated based on an RF power signal generated by an RF generator of a radio frequency (RF) power system. To efficiently perform plasma etching, the RF power signal generated by the RF generator must be precis...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H03L5/02H03F1/56H03H11/28
CPCH03F1/32H03F1/56H03F3/189H03H7/40H05H1/36H03F3/191
Inventor 戴维·J·库莫
Owner MKS INSTR INC
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