Two-in-parallel parallel decoupling flexible microposition mechanism

Abstract

The invention discloses a two-in-parallel parallel decoupling flexible microposition mechanism, which is based on piezoelectric ceramic driving, and is characterized in that: the product comprises a movable platform, four flexible branched chains, two piezoelectric ceramic drivers, one rigid bracing frame and one pedestal; the mechanism is used for supporting four flexible branched chains and forms a Chinese character Tian shaped structure together with the rigid bracing frame of the movable platform, and the movable is located in the center, and four flexible branched chains with rectangular designs are uniformly distributed outside the four rigid edges of the rigid bracing frame, and each flexible branched chain is composed of an internal double-four rod flexible mechanism and an external double-parallelogram flexible mechanism; two piezoelectric ceramic drivers have the same structures, and one is placed horizontally and the other is placed vertically; the pedestal has a square framework structure with a hollow central section, and a sidewall structure protruded upwards along the frame near four drift angles is provided, simultaneously four block shaped protrusions are extended from the bottom to the internal direction of the pedestal.

Description

technical field [0001] The invention belongs to a micro-operating system in the mechanical field, in particular to a double-parallel parallel decoupling flexible micro-positioning mechanism. The micro-positioning mechanism is driven by piezoelectric ceramics, has two degrees of freedom, and can realize two linear translation movements, and is mainly used in the field of imprint lithography. Background technique [0002] Nanoimprint lithography is a brand-new nano-pattern replication method with obvious advantages and strong competitiveness. It fundamentally shows the broad prospects for the production of nano-devices. It was planned as the next generation by the International Semiconductor Blueprint Agency at the end of 2003. Key technologies of 32nm node lithography process. [0003] Positioning platforms or stages have always been a critical part of traditional lithography systems. Existing precision positioning platforms used in lithography systems mostly use air flotat...

AI Technical Summary

Problems solved by technology

Although the adaptive adjustment precision system is simple in structure, compact and low in cost, its positioning accuracy, especially the adjustment accuracy of parallelism is low, which limits the improvement of processing accuracy and quality

Although some other precision positioning mechanisms have introduced active adjustment mechanisms, they still use piezoelectric ceramic direct drive methods, which only have partial degrees of freedom to achieve active adjustment, and this method is also limited by the compensation of parallelism errors in the imprinting process.

Images