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Memory manager and management method of vxworks-based dual-workpiece control system for lithography machine

A control system and dual-workpiece technology, applied in the direction of memory address/allocation/relocation, etc., can solve problems affecting system operation, etc., and achieve the effect of efficient management and reduced internal and external fragments

Active Publication Date: 2016-01-20
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention aims to solve the problem that the existing VxWorks-based lithography machine dual-workpiece control system memory management method will generate a large number of fragments, which will affect the normal operation of the system, and provides a VxWorks-based lithography machine duplex Memory manager and management method of software platform control system

Method used

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  • Memory manager and management method of vxworks-based dual-workpiece control system for lithography machine
  • Memory manager and management method of vxworks-based dual-workpiece control system for lithography machine
  • Memory manager and management method of vxworks-based dual-workpiece control system for lithography machine

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specific Embodiment approach 1

[0045] Specific implementation mode one: the following combination figure 1 and figure 2 Illustrate this embodiment, the memory manager of the VxWorks-based lithography machine double workpiece platform control system described in this embodiment, it includes:

[0046] An initialization device for initializing the memory of the dual workpiece table control system of the lithography machine;

[0047] A memory allocation device for allocating the memory of the dual-workpiece control system of the lithography machine;

[0048] A memory release device used for managing the memory of a control system of a photolithography machine with a double worktable.

[0049] The implementation process of this embodiment is the same as that of the fifth embodiment, and the two workpiece stages refer to the workpiece stage and the mask stage of the lithography machine.

specific Embodiment approach 2

[0050] Specific implementation mode two: this implementation mode further explains implementation mode one, and the initialization device described in this implementation mode includes:

[0051]A device for storing the motion trajectory of the double worktable of the lithography machine and all parameters of the control system;

[0052] A system function device for dividing the memory of the double-workpiece control system of a lithography machine into three memory areas. The three memory areas are a system kernel memory area, an adjustable memory area, and a heap memory area. The three memory areas They are respectively divided into memory block queues of different sizes; the system kernel memory area includes: a device for prohibiting users from accessing the system kernel memory area and protecting the system kernel memory area;

[0053] A device for establishing corresponding tasks according to the application of the control system, automatically adjusting the memory of th...

specific Embodiment approach 3

[0115] Specific implementation mode three: the following combination figure 1 For illustration, this implementation mode further describes the second implementation mode, and the memory allocation device described in this implementation mode includes:

[0116] Use the interface function memMalloc(UNIT32size) to find a memory queue larger than size, and check whether there are remaining memory blocks in the memory queue. If there are remaining memory blocks, continue to check whether the remaining memory size can be split. The split memory block is inserted into the corresponding queue. When it cannot be split, the entire remaining memory block is allocated; Interface function device for updating variables at the head of the memory queue.

[0117] The implementation process of this embodiment is the same as that of Embodiment 7, which needs to be repeated. Among them, the infrequently used memory queue is a queue with a small statistical value, and the search can be realized b...

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Abstract

The invention discloses a memory manager and a management method for a VxWorks-based photo-etching machine double workpiece table control system, belonging to the technical field of memory management of a photo-etching machine working table control system and aiming at solving the problem of influence on normal operation of the system due to production of a large number of fragments existing in the conventional memory management method for the VxWorks-based photo-etching machine double workpiece table control system. The memory manager comprises an initialization device for initializing memory of the photo-etching machine double workpiece table control system, a memory allocation device for allocating the memory of the photo-etching machine double workpiece table control system, and a memory release device for managing the memory of the photo-etching machine double workpiece table control system. The memory manager and the management method are used for managing the memory of the photo-etching machine double workpiece table control system.

Description

technical field [0001] The invention relates to a memory manager and a management method of a VxWorks-based double-worktable control system of a lithography machine, and belongs to the technical field of memory management of a workbench control system of a lithography machine. Background technique [0002] VxWorks operating system is an embedded real-time operating system, and its memory management is an important research topic, and it is also a difficult problem to be solved in practical engineering applications. Traditional memory management methods include first-match method, partner algorithm, once-allocated multiple-use algorithm, etc. Among them, the first matching algorithm uses two linked lists to manage the memory, and the time for whether the memory is allocated or recovered is proportional to the length of the linked list. The uncertainty of the time limits the use of the first matching method in real-time systems; The buddy algorithm will affect the merging of ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F12/02G06F12/06
Inventor 陈兴林刘川史新妍李慧璐王伟峰
Owner HARBIN INST OF TECH