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An arc extinguishing method for magnetron sputtering process

A magnetron sputtering and arc technology, applied in the field of surface engineering, can solve the problems of high shutdown rate, low speed and efficiency of arc detection and extinguishment, etc., to reduce the number of shutdowns, improve arc detection rate, and fast detection and extinguishment Effect

Inactive Publication Date: 2016-02-24
XIAN UNIV OF TECH
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Problems solved by technology

[0006] The purpose of the present invention is to provide an arc extinguishing method for the magnetron sputtering process, which solves the problems of low speed and efficiency of arc detection and extinguishing in the prior art, and high shutdown rate caused by the arc

Method used

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  • An arc extinguishing method for magnetron sputtering process
  • An arc extinguishing method for magnetron sputtering process

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Embodiment Construction

[0027] The present invention provides an arc extinguishing method for a magnetron sputtering process, such as figure 1 shown, follow the steps below:

[0028] Step 1: Use the voltage and current Hall sensors to collect the output voltage and current of the magnetron sputtering power supply, and use the current amplitude and the voltage drop rate as the judgment basis to carry out arc detection, which is specifically implemented according to the following steps: using the voltage detection method and the current The detection method detects the arc at the same time. As long as there is one method to detect the arc first, the arc is considered to be generated.

[0029] Among them, the voltage detection method is specifically implemented according to the following steps: in the magnetron sputtering power supply controller, the continuously collected voltage values ​​are calculated, that is, the current collected voltage value is compared with the previous collected voltage value....

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Abstract

The invention discloses an arc extinguishing method for a magnetron sputtering process. First, the output voltage and current of a magnetron sputtering power supply are sampled, and arc detection is performed according to the voltage slope and current amplitude to determine whether an arc is generated; secondly, according to Arc classification is performed on the magnitude of the current generated by the arc, and the arc is divided into a first arc type and a second arc type; finally, arc extinguishing treatment is performed on the first arc type and the second arc type respectively. The invention can quickly detect and extinguish the arc generated in the magnetron sputtering process, the method is simple, feasible and easy to realize, and makes up for the problems of false detection and missing detection and loss of process intervals in the previous arc detection and extinguishing methods, and can effectively Protect sputtering targets, process bays and power supplies.

Description

technical field [0001] The invention belongs to the technical field of surface engineering, and in particular relates to an arc extinguishing method for a magnetron sputtering process. Background technique [0002] The magnetron sputtering ion coating technology is different from the traditional surface heat treatment, the various parameters required will change with the film growth process, and the load is constantly changing in a wide range. This requires the coating equipment to have good reliability and stability to ensure product quality. [0003] During the magnetron sputtering coating process, the "arcing" caused by the abnormal discharge of the target material may lead to the deterioration of the coating effect, the burning of the fuse, and even the power supply. In the past, the magnetron sputtering power supply, in the face of the phenomenon of "arcing", mainly adopted two solutions. One is to increase the current withstand capability of the power supply, that is,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35
Inventor 陈桂涛孙天乐孙强黄西平
Owner XIAN UNIV OF TECH
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