A method of coating nano-scale oxide film on fluorescent powder by atomic layer deposition technology

A nano-scale oxide, atomic layer deposition technology, applied in nanotechnology, nanotechnology, nanotechnology and other directions for materials and surface science, can solve the problem of high consumption of pure water, high temperature control requirements, high equipment requirements, etc. problem, to achieve the effect of dense coating film and improved performance

Active Publication Date: 2016-03-02
江苏迈纳德微纳技术有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Wet technology is mainly carried out in liquid medium, the requirements for equipment are simple, and the requirements for temperature control are high. The main disadvantage is that the coating layer is not uniform, and the thickness is usually too large.
In addition, the preparation process requires a large amount of pure water, and the amount of toxic and harmful waste liquid to be treated is large.
The traditional dry process is simpler than the wet process, and there is no waste liquid or a small amount of waste liquid, but the requirements for equipment are higher, and the temperature must be precisely controlled
In addition, the production process is not easy to control when using dry coating, and the coating quality is not high
[0003] The inventors of this application previously invented the micro-nano scale powder protective layer wrapping device and the micro-nano scale powder protective layer wrapping method (patent number: ZL20111419358.4), the method in which can not really achieve the coating of the phosphor

Method used

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  • A method of coating nano-scale oxide film on fluorescent powder by atomic layer deposition technology
  • A method of coating nano-scale oxide film on fluorescent powder by atomic layer deposition technology
  • A method of coating nano-scale oxide film on fluorescent powder by atomic layer deposition technology

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Effect test

Embodiment 1

[0026] A method of coating nano-scale oxide films on phosphors using atomic layer deposition technology. The silicate phosphor SDS600100g purchased from Hild New Materials Co., Ltd. was selected as a sample, and an aluminum oxide diaphragm was deposited on the surface of the phosphors. Thin film 36nm, the specific process steps are:

[0027] 1) Open the external cavity of the micro-nano-scale powder protective layer wrapping device, take out the internal powder reaction device, put the fluorescent powder in, and seal the external cavity.

[0028] 2) Turn on high-purity nitrogen as the carrier gas, and turn on ordinary gas as the pulse gas;

[0029] 3) Setting parameters: set the temperature of the reaction chamber system, equipment piping, and other components, when the displayed temperature is the same as the set temperature and the fluctuation range is less than or equal to 1 o C to enter the next step;

[0030] The setting parameters are: the cavity temperature is set to ...

Embodiment 2

[0039] A method of coating nano-scale oxide films on phosphors using atomic layer deposition technology. The silicate phosphor SDS600100g purchased from Hild New Materials Co., Ltd. was selected as a sample, and an aluminum oxide diaphragm was deposited on the surface of the phosphors. Thin film 18nm, the specific process steps are:

[0040] 1) Open the external cavity of the micro-nano-scale powder protective layer wrapping device, take out the internal powder reaction device, put the fluorescent powder in, and seal the external cavity.

[0041] 2) Turn on high-purity nitrogen as the carrier gas, and turn on ordinary gas as the pulse gas;

[0042] 3) Setting parameters: set the temperature of the reaction chamber system, equipment piping, and other components, when the displayed temperature is the same as the set temperature and the fluctuation range is less than or equal to 1 o C to enter the next step;

[0043]The setting parameters are: the cavity temperature is set to 1...

Embodiment 3

[0052] A method of coating nano-scale oxide films on phosphors using atomic layer deposition technology. The silicate phosphor SDS525100g purchased from Hild New Materials Co., Ltd. was selected as a sample, and an aluminum oxide diaphragm was deposited on the phosphor surface Thin film 36nm, the specific process steps are:

[0053] 1) Open the external cavity of the micro-nano-scale powder protective layer wrapping device, take out the internal powder reaction device, put the fluorescent powder in, and seal the external cavity.

[0054] 2) Turn on high-purity nitrogen as the carrier gas, and turn on ordinary gas as the pulse gas;

[0055] 3) Setting parameters: set the temperature of the reaction chamber system, equipment piping, and other components, when the displayed temperature is the same as the set temperature and the fluctuation range is less than or equal to 1 o C to enter the next step;

[0056] The setting parameters are: the cavity temperature is set to 200°C, th...

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Abstract

The present invention discloses a method of using the atomic layer deposition technology to cover the nanocarium -grade oxide film on the fluorescent powder, including the following steps: 1) Open the external cavity of the micro -nano -scale powder protective layer package, take out the internal powder reaction reactionAfter putting the fluorescent powder in, the outer cavity is sealed; 2) Open high pure nitrogen as a load gas and open ordinary gas as a pulse gas; 3) Set the parameters; 4) Select the deposition mode;Set the speed of the cavity; 7) Open the vacuum pump; 8) Start the circulation deposition.Based on the previously invented device, the present invention process achieved the process parameters of the atomic layer deposition (ALD) technology in the periphery of the fluorescent powder to improve its performance.It can reach a single layer of cover, and the covering film is very dense.

Description

technical field [0001] The invention relates to a fluorescent powder coating process. Background technique [0002] The traditional technologies for surface coating of phosphors are divided into dry method and wet method. Wet technology is mainly carried out in liquid medium, which has simple requirements for equipment and high requirements for temperature control. Its main disadvantage is that the coating layer is uneven and usually thick. In addition, the preparation process consumes a large amount of pure water, and a large amount of toxic and harmful waste liquid is treated. The traditional dry process is simpler than the wet process, and there is no waste liquid or a small amount of waste liquid, but it has higher requirements for equipment and precise temperature control. In addition, the production process is not easy to control when using dry coating, and the coating quality is not high. [0003] The inventors of the present application previously invented the mic...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/455C23C16/40B82Y30/00
Inventor 左雪芹梅永丰
Owner 江苏迈纳德微纳技术有限公司
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